Moors Johannes Hubertus Josephina

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Featured researches published by Moors Johannes Hubertus Josephina.

Archive | 2010

Measuring system for determining the position of a reflective optical component in a micro-lithography projection illumination facility has a unit as a source of light to measure rays

Ehm Dirk Heinrich; Kampen Maarten Van; Schmidt Stefan-Wolfgang; Moors Johannes Hubertus Josephina; Horn Jan

Archive | 2009

METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE, METHOD FOR GENERATING A CLEANING GAS, AND CORRESPONDING CLEANING AND CLEANING GAS GENERATION ARRANGEMENTS

Storm Arnold; Ehm Dirk Heinrich; Moors Johannes Hubertus Josephina; Wolschrijn Bastiaan Theodoor; Stein Thomas; Te Sligte Edwin

Archive | 2009

Optical arrangement for extreme UV lithography device, has reflective optical elements including particular operating temperature, where optical characteristics of arrangement are optimized for operation

Ehm Dirk Heinrich; Moors Johannes Hubertus Josephina; Wolschrijn Bastiaan Theodoor

Archive | 2010

Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of an internal sensor of a lithographic apparatus

Moors Johannes Hubertus Josephina; Wolschrijn Bastiaan Theodoor; Ehm Dirk Heinrich

Archive | 2008

Method for measuring degassing and euv-lithography device and measuring assembly

Kraus Dieter; Ehm Dirk Heinrich; Wolschrijn Bastiaan Theodoor; Moors Johannes Hubertus Josephina

Archive | 2018

Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element

Sjmaenok Leonid Aizikovitch; Banine Vadim Yevgenyevich; Moors Johannes Hubertus Josephina; Glushkov Denis Alexandrovich; Yakunin Andrei Mikhailovich

Archive | 2014

Device for euv lithography with reduced contamination

Ehm Dirk Heinrich; Muellender Stephan; Stein Thomas; Moors Johannes Hubertus Josephina; Wolschrijn Bastiaan Theodoor; Kraus Dieter; Versluis Richard; Meijerink Marcus Gerhardus Hendrikus

Archive | 2012

Multi-layer spectral purity filter, lithographic a

Banine Vadim Yevgenyevich; Moors Johannes Hubertus Josephina; Sjmaenok Leonid; Salashchenko Nikolay

Archive | 2012

HEAT ADJUSTING SYSTEM AND HEAT ADJUSTING METHOD FOR ADJUSTING ONE PART OF LITHOGRAPHIC DEVICE

Lambertus Donders Sjoerd Nicolaas; Banine Vadim Yevgenyevich; Moors Johannes Hubertus Josephina; Verhagen Martinus Cornelis Maria; Olav Waldemar Vladimir Frijns; Van Donk Gerrit; Henk Jan van Gerner

Archive | 2011

Verfahren zur Reinigung eines Elements einer lithografischen Vorrichtung

Rakhimova Tatyana Victorovna; Banine Vadim Yevgenyevich; Ivanov Vladimir Vitalevitch; Koshelev Konstantin Nikolaevitch; Moors Johannes Hubertus Josephina; Kovalev Aleksander Sergeevich; Lopaev Dmitriy Victorovich

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