F. Iga
Tohoku University
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Publication
Featured researches published by F. Iga.
international electron devices meeting | 2011
Tetsuo Endoh; Shuta Togashi; F. Iga; Yusuke Yoshida; Takashi Ohsawa; Hiroki Koike; Shunsuke Fukami; S. Ikeda; Naoki Kasai; Noboru Sakimura; Takahiro Hanyu; H. Ohno
The incubation (transit) time of the perpendicular magnetic tunnel junction (MTJ) is found shorter (longer) than the in-plane MTJ. By making use of the incubation time, a new concept is proposed for MTJ/CMOS hybrid circuits that operate as fast as CMOS circuits without operation power overhead and with negligible MTJ switching error. A nonvolatile latch based on the concept is fabricated in 90nm technology to demonstrate 600MHz stable operation.
The Japan Society of Applied Physics | 2011
F. Iga; Yoshio Suzuki; Takashi Ohsawa; S. Ikeda; Takahiro Hanyu; H. Ohno; Tetsuo Endoh
to Improve Switching Probability and Write Speed Fumitaka Iga, Yasuhiko Suzuki, Takashi Ohsawa, Shoji Ikeda, Takahiro Hanyu, Hideo Ohno, and Tetsuo Endoh 1 Center for Interdisciplinary Research, Tohoku University, Aramaki Aza-Aoba 6-3, Aoba-ku, Sendai 980-8578, Japan Phone: +81-22-795-4401 E-mail: [email protected] 2 Center for Spintronics Integrated Systems, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan 3 Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
Japanese Journal of Applied Physics | 2010
Tetsuo Endoh; F. Iga; Shoji Ikeda; K. Miura; Jun Hayakawa; Masashi Kamiyanagi; Haruhiro Hasegawa; Takahiro Hanyu; Hideo Ohno
In this paper, we have described the complementary metal–oxide–semiconductor (CMOS)/magnetic tunnel junction (MTJ) integrated process technology; MTJs were fabricated on via metal with surface roughness of 0.3 nm with 0.14 µm CMOS process and 60 ×180 nm2 MTJ process. It is shown that by this process technology, the fabricated MTJ on CMOS logic circuit plane achieves a large change in a resistance of 3.63 kΩ (anti-parallel) with the TMR ratio of 138% at room temperature, which is large enough for a sensing scheme of standard CMOS logic. Furthermore, we have successfully demonstrated the DC and AC operation of this MTJ with write transistors. As the results, our MTJ achieves high enough write/read performance with transistors for realizing MTJ-based logic circuits.
The Japan Society of Applied Physics | 2009
Tetsuo Endoh; F. Iga; S. Ikeda; K. Miura; Jun Hayakawa; Masashi Kamiyanagi; Haruhiro Hasegawa; Takahiro Hanyu; H. Ohno
Center for Interdisciplinary Research, Tohoku University, Aramaki aza Aoba 6-3, Aoba-ku, Sendai 980-8578, Japan, Phone: +81-22-217-4401 E-mail: [email protected] 2 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan Advanced Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan 4 Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
Japanese Journal of Applied Physics | 2012
Takashi Ohsawa; F. Iga; Shoji Ikeda; Takahiro Hanyu; Hideo Ohno; Tetsuo Endoh
The Japan Society of Applied Physics | 2011
Takashi Ohsawa; F. Iga; S. Ikeda; Takahiro Hanyu; H. Ohno; Tetsuo Endoh
The Japan Society of Applied Physics | 2011
F. Iga; Yusuke Yoshida; S. Ikeda; Takahiro Hanyu; Hideo Ohno; Tetsuo Endoh
siam international conference on data mining | 2009
Masashi Kamiyanagi; F. Iga; S. Ikeda; K. Miura; Jun Hayakawa; Haruhiro Hasegawa; Takahiro Hanyu; Hideo Ohno; Tetsuo Endoh
IEICE Transactions on Electronics | 2010
F. Iga; Masashi Kamiyanagi; Shoji Ikeda; K. Miura; Jun Hayakawa; Haruhiro Hasegawa; Takahiro Hanyu; Hideo Ohno; Tetsuo Endoh
IEICE Transactions on Electronics | 2010
Masashi Kamiyanagi; F. Iga; Shoji Ikeda; K. Miura; Jun Hayakawa; Haruhiro Hasegawa; Takahiro Hanyu; Hideo Ohno; Tetsuo Endoh