Frank Mehnke

Performance Characteristics of UV-C AlGaN-Based Lasers Grown on Sapphire and Bulk AlN Substrates

The performance characteristics of optically pumped laser heterostructures emitting in the UV-C spectral range between 272 and 279 nm are investigated. The laser heterostructures were grown by metal-organic vapor phase epitaxy on (0001) planar AlN/sapphire, epitaxially laterally overgrown (ELO) AlN/sapphire, and bulk AlN substrates with threading dislocation densities ranging from 2×1010 to 104 cm-2. We found that the defect density strongly affects the laser performance. The lowest pulse threshold energy density of 50 mJ/cm2 under resonant optical pumping condition was obtained for an AlGaN multiple quantum well laser grown pseudomorphically on low defect density bulk AlN substrate. Lasing was also observed for AlGaN MQW heterostructures grown on ELO AlN/sapphire templates. The laser emission in all lasers was TE polarized. However, no lasing was observed for heterostructures grown on high defect density AlN/sapphire.

Efficient charge carrier injection into sub-250 nm AlGaN multiple quantum well light emitting diodes

The design and Mg-doping profile of AlN/Al0.7Ga0.3N electron blocking heterostructures (EBH) for AlGaN multiple quantum well (MQW) light emitting diodes (LEDs) emitting below 250 nm was investigated. By inserting an AlN electron blocking layer (EBL) into the EBH, we were able to increase the quantum well emission power and significantly reduce long wavelength parasitic luminescence. Furthermore, electron leakage was suppressed by optimizing the thickness of the AlN EBL while still maintaining sufficient hole injection. Ultraviolet (UV)-C LEDs with very low parasitic luminescence (7% of total emission power) and external quantum efficiencies of 0.19% at 246 nm have been realized. This concept was applied to AlGaN MQW LEDs emitting between 235 nm and 263 nm with external quantum efficiencies ranging from 0.002% to 0.93%. After processing, we were able to demonstrate an UV-C LED emitting at 234 nm with 14.5 μW integrated optical output power and an external quantum efficiency of 0.012% at 18.2 A/cm2.

Highly conductive n-AlxGa1−xN layers with aluminum mole fractions above 80%

Silicon doping of AlxGa1−xN layers with high aluminum mole fractions (0.8 < x < 1) was studied. The AlGaN:Si layers were pseudomorphically grown by metalorganic vapor phase epitaxy on low defect density epitaxially laterally overgrown AlN/sapphire templates. The effects of SiH4/III ratio and aluminum content on the resistivity, the carrier concentration, and the mobility have been investigated. By variation of the SiH4/III ratio during the growth of AlxGa1−xN:Si layers, a recorded low resistivity of Al0.81Ga0.19N:Si was obtained with 0.026 Ω cm. The resistivity increases exponentially with increasing aluminum content to 3.35 Ω cm for Al0.96Ga0.04N, and the optimum SiH4/III ratio is shifted towards lower values. Hall effect measurements show that the increase of the resistivity with increasing aluminum mole fraction is mainly caused by a decrease of the carrier density. The optimized Al0.81Ga0.19N:Si exhibits a carrier concentration of 1.5 × 1019 cm−3 and a mobility of the carriers of 16.5 cm2 V−1 s−1.

Improved injection efficiency in 290 nm light emitting diodes with Al(Ga)N electron blocking heterostructure

The effect of different Al(Ga)N electron blocking heterostructures (EBH) on the emission spectra and light output power of 290 nm light emitting diodes (LEDs) has been investigated. The carrier injection and internal quantum efficiency of the LEDs is simulated and compared to electroluminescence measurements. The highest light output power has been found for LEDs with an Mg-doped AlN/Al0.7Ga0.3N EBH with an AlN layer thickness >3 nm. The output power of these LEDs was 8.5-times higher compared to LEDs without EBH. This effect is attributed to an improved carrier injection and confinement which prevents electron leakage into the p-doped region of the LED with a simultaneously enhanced hole injection into the active region.

High-power UV-B LEDs with long lifetime

UV light emitters in the UV-B spectral range between 280 nm and 320 nm are of great interest for applications such as phototherapy, gas sensing, plant growth lighting, and UV curing. In this paper we present high power UV-B LEDs grown by MOVPE on sapphire substrates. By optimizing the heterostructure design, growth parameters and processing technologies, significant progress was achieved with respect to internal efficiency, injection efficiency and light extraction. LED chips emitting at 310 nm with maximum output powers of up to 18 mW have been realized. Lifetime measurements show approximately 20% decrease in emission power after 1,000 operating hours at 100 mA and 5 mW output power and less than 30% after 3,500 hours of operation, thus indicating an L50 lifetime beyond 10,000 hours.

Strongly transverse-electric-polarized emission from deep ultraviolet AlGaN quantum well light emitting diodes

The optical polarization of emission from ultraviolet (UV) light emitting diodes (LEDs) based on (0001)-oriented AlxGa1−xN multiple quantum wells (MQWs) has been studied by simulations and electroluminescence measurements. With increasing aluminum mole fraction in the quantum well x, the in-plane intensity of transverse-electric (TE) polarized light decreases relative to that of the transverse-magnetic polarized light, attributed to a reordering of the valence bands in AlxGa1−xN. Using k ⋅ p theoretical model calculations, the AlGaN MQW active region design has been optimized, yielding increased TE polarization and thus higher extraction efficiency for bottom-emitting LEDs in the deep UV spectral range. Using (i) narrow quantum wells, (ii) barriers with high aluminum mole fractions, and (iii) compressive growth on patterned aluminum nitride sapphire templates, strongly TE-polarized emission was observed at wavelengths as short as 239 nm.

Degradation of (InAlGa)N-based UV-B light emitting diodes stressed by current and temperature

The degradation of the electrical and optical properties of (InAlGa)N-based multiple quantum well light emitting diodes (LEDs) emitting near 308 nm under different stress conditions has been studied. LEDs with different emission areas were operated at room temperature and at constant current densities of 75 A/cm2, 150 A/cm2, and 225 A/cm2. In addition, the heat sink temperature was varied between 15 °C and 80 °C. Two main modes for the reduction of the optical power were found, which dominate at different times of operation: (1) Within the first 100 h, a fast drop of the optical power is observed scaling exponentially with the temperature and having an activation energy of about 0.13 eV. The drop in optical power is accompanied by changes of the current-voltage (I-V) characteristic. (2) For operation times beyond 100 h, the optical power decreases slowly which can be reasonably described by a square root time dependence. Here, the degradation rate depends on the current density, rather than the current. A...

AlGaN-based deep UV LEDs grown on sputtered and high temperature annealed AlN/sapphire

The performance characteristics of AlGaN-based deep ultraviolet light emitting diodes (UV-LEDs) grown by metalorganic vapor phase epitaxy on sputtered and high temperature annealed AlN/sapphire templates are investigated and compared with LEDs grown on epitaxially laterally overgrown (ELO) AlN/sapphire. The structural and electro-optical properties of the devices on 350 nm sputtered and high temperature annealed AlN/sapphire show similar defect densities and output power levels as LEDs grown on low defect density ELO AlN/sapphire templates. After high temperature annealing of the 350 nm sputtered AlN, the full widths at half maximum of the (0002) and (101¯2) reflections of the high resolution x-ray diffraction rocking curves decrease by one order of magnitude to 65 arc sec and 240 arc sec, respectively. The curvature of the sputtered and HTA AlN/sapphire templates after regrowth with 400 nm MOVPE AlN is with −80 km−1 much lower than the curvature of the ELO AlN/sapphire template of −160 km−1. The on-wafer...

Anisotropic optical properties of semipolar AlGaN layers grown on m-plane sapphire

The valence band order of AlxGa  1−x N is investigated experimentally by analyzing the anisotropic dielectric functions of semipolar (112¯2) AlGaN thin films grown on m-plane Al2O3. Point-by-point fitted dielectric functions are obtained by spectroscopic ellipsometry and corresponding inter-band transition energies are extracted. The known strain situation of the sample layers is used to correct for the small strain-induced energy shifts within k · p perturbation theory. It also is used to identify transitions related to the three valence bands. Transitions with E ⊥ c from the Γ9 valence band verify an inter-band bowing parameter of b=0.9 eV. The transitions with E || c allow determining the crystal field splitting energy which can be described by a linear interpolation between the values for GaN and AlN satisfactorily.

Electronic properties of Si-doped Alx Ga1−xN with aluminum mole fractions above 80%

The dependence of the activation energy as well as the energetic levels of the neutral charge state and the DX center of the Si donor in Alx Ga1−xN:Si samples on aluminum content and SiH4/III ratio were investigated by electron paramagnetic resonance (EPR) measurements, Van-der-Pauw resistivity measurements, and Hall-effect measurements. It was found by EPR measurements that the energy distance of the neutral charge state of the Si donor from the conduction band increases with increasing aluminum content from 61 meV for x = 0.82 to 106 meV for x = 0.89. Additionally, the formation of a DX center below the neutral charge state which is deepening from 6 meV for x = 0.82 to 58 meV for x = 0.89 is observed. This results in a linearly increasing activation energy with increasing aluminum content from 67 meV for x = 0.82 to 164 meV for x = 0.89. This is consistent with the activation energies as determined by Hall-effect measurements showing a linear increase from 24 meV for x = 0.85 to 211 meV for x = 0.96, as...