Franz Neppl
Siemens
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Franz Neppl.
international symposium on microarchitecture | 1992
Armin Wieder; Franz Neppl
CMOS has become the mainstream IC technology. Extending well into the sub-0.1- mu m regime, its potential provides enormous chip complexities for integration of complete systems on one chip. A number of general trends in the development and manufacturing of CMOS technologies and ICs are discussed. It is argued that unrestricted availability of this technology is of strategic importance for the European high-technology industry. Exploding development costs and investments per technology generation require global cooperation, particularly for the relatively small European IC manufacturers to survive in this key technology. Trends in the development of 64-Mb and 256-Mb DRAMs, optical lithography processes, multilayer resist technologies, retrograde-well structures for CMOS device isolation, low-resistive and dense interconnection systems with low capacitances and silicon-on-insulator technology for the development of CMOS devices are described.<<ETX>>
Archive | 1988
Franz Neppl; Josef Winnerl
Archive | 1987
Franz Neppl; Erwin Jacobs; Josef Winnerl; Carlos-Alberto Mazure-Espejo
Archive | 1994
Franz Neppl; Josef Winnerl
Archive | 1984
Ulrich Schwabe; Franz Neppl; Ulf Burker; Werner Christoph
Archive | 1989
Franz Neppl; Josef Winnerl
Archive | 1997
Franz Neppl
Archive | 1983
Ulrich Schwabe; Franz Neppl; Konrad Hieber
Archive | 1986
Heike Gierisch; Franz Neppl
Archive | 1989
Josef Winnerl; Franz Neppl