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Dive into the research topics where Gerardo Delgadino is active.

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Featured researches published by Gerardo Delgadino.


Solid State Phenomena | 2016

Optimization of Cu/Low-k Dual Damascene Post-Etch Residue and TiN Hard Mask Removal

Alexander Kabansky; Glenn Westwood; Samantha Tan; Frederic Kovacs; David Lou; Joe Han; Gerardo Delgadino; H.W. Chang

For advanced technology nodes TiN hard mask integration into Cu/low-k via/trench DD process requires the mask to be fully stripped after DD etching. The one-step H2O2 containing wet chemical clean aiming to removing TiN mask often failed to simultaneously clean etch residue. We developed more reliable two-step wet chemical process combining a solvent-based post-etch residue clean followed by a solvent/H2O2 mixture strip for TiN mask removal. Bath lifetime optimization was also demonstrated.


Archive | 2011

TRIODE REACTOR DESIGN WITH MULTIPLE RADIOFREQUENCY POWERS

Rajinder Dhindsa; Alexei Marakhtanov; Gerardo Delgadino; Eric Hudson; Bi Ming Yen; Andrew D. Bailey


Archive | 2008

Bi-layer, tri-layer mask CD control

Gerardo Delgadino; Robert C. Hefty


224th ECS Meeting (October 27 – November 1, 2013) | 2013

Effective Defect Control in TiN Metal Hard Mask Cu/Low-k Dual Damascene Process

Alexander Kabansky; Samantha Tan; Eric Hudson; Gerardo Delgadino; Lajos Gancs; Jeffrey Marks


Archive | 2015

INTEGRATED ETCH/CLEAN FOR DIELECTRIC ETCH APPLICATIONS

Reza Arghavani; Shashank C. Deshmukh; Eric Hudson; Tom Kamp; Samantha Tan; Gerardo Delgadino


Archive | 2013

Method of stripping organic mask with reduced damage to low-K film

John M. Nagarah; Gerardo Delgadino


Archive | 2012

Dual zone temperature control of upper electrodes

Alexei Marakhtanov; Rajinder Dhindsa; Ryan Bise; Lumin Li; Sang Ki Nam; James Rogers; Eric Hudson; Gerardo Delgadino; Andrew D. Bailey; Mike Kellogg; Anthony de la Llera


Archive | 2010

Method for low-k dielectric etch with reduced damage

Bing Ji; Kenji Takeshita; Andrew D. Bailey; Eric Hudson; Maryam Moravej; Stephen M. Sirard; Jungmin Ko; Daniel Le; Robert C. Hefty; Yu Cheng; Gerardo Delgadino; Bi-Ming Yen


Archive | 2017

Hydrogen activated atomic layer etching

Xin Zhang; Alan J. Jensen; Gerardo Delgadino; Daniel Le


Archive | 2016

AIR GAP SPACER INTEGRATION FOR IMPROVED FIN DEVICE PERFORMANCE

Paul Raymond Besser; Bart van Schravendijk; Yoshie Kimura; Gerardo Delgadino; Harald Orkorn-schmidt; Dengliang Yang

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