Gurumakonda R. Srinivasan

Total dielectric isolation for integrated circuits

Semiconductor device and process

Selective epitaxy method using laser annealing for making filamentary transistors

Method for making a base etched transistor integrated circuit

Method and resulting structure for selective multiple base width transistor structures

Method for making a high performance transistor integrated circuit

High performance integrated circuit having modified extrinsic base

Selective epitaxy method for making filamentary pedestal transistor

Silicon tetrachloride epitaxial process for producing very sharp autodoping profiles and very low defect densities on substrates with high concentration buried impurity layers utilizing a preheating in hydrogen

Method to make a silicon layer being partly polycrystalline and partly monocrystalline