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Hamid Tavassoli

Applied Materials

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Publication

Featured researches published by Hamid Tavassoli.

Archive | 2006

Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2005

Apparatus for controlling gas flow in a semiconductor substrate processing chamber

Kallol Bera; Heeyeop Chae; Hamid Tavassoli; Yan Ye

Archive | 2006

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2003

Cathode pedestal for a plasma etch reactor

Jang Yang; Daniel J. Hoffman; Brian Lue; Tetsuya Ishikawa; Douglas A. Buchberger; Semyon L. Kats; Hamid Tavassoli; Kang-Lie Chiang; Heeyeop Chae

Archive | 2010

Capacitively coupled plasma reactor having very agile wafer temperature control

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; William W. Cowans; Glenn W. Zubillaga; Isaac Millan

Archive | 2005

Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction

Daniel J. Hoffman; Roger Alan Lindley; Michael C. Kutney; Martin Jeff Salinas; Hamid Tavassoli; Keiji Horioka; Douglas A. Buchberger

Archive | 2006

Method for agile workpiece temperature control in a plasma reactor using a thermal model

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; Williams W. Cowans; Glenn W. Zubillaga; Isaac Millian

Archive | 2010

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2013

SYMMETRIC PLASMA PROCESS CHAMBER

James D. Carducci; Hamid Tavassoli; Ajit Balakrishna; Zhigang Chen; Andrew Nguyen; Douglas A. Buchberger; Kartik Ramaswamy; Shahid Rauf; Kenneth S. Collins

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Collaboration

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Douglas A. Buchberger

Applied Materials

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Kallol Bera

Drexel University

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Daniel J. Hoffman

Applied Materials

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Richard Fovell

Applied Materials

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Douglas H. Burns

Applied Materials

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Paul Brillhart

Applied Materials

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Shahid Rauf

Applied Materials

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Kenneth S. Collins

Applied Materials

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Xiaoping Zhou

Applied Materials

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Fernando M. Silveira

Applied Materials

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