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Richard Fovell

Applied Materials

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Publication

Featured researches published by Richard Fovell.

Archive | 2007

Method and apparatus for controlling gas flow to a processing chamber

Ezra Robert Gold; Richard Fovell; James P. Cruse; Jared Ahmad Lee; Bruno Geoffrion; Douglas A. Buchberger; Martin Jeff Salinas

Archive | 2006

Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2010

Capacitively coupled plasma reactor having very agile wafer temperature control

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Method of operating a capacitively coupled plasma reactor with dual temperature control loops

Paul Brillhart; Richard Fovell; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; William W. Cowans; Glenn W. Zubillaga; Isaac Millan

Archive | 2006

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; William W. Cowans; Glenn W. Zubillaga; Isaac Millan

Archive | 2006

Method for agile workpiece temperature control in a plasma reactor using a thermal model

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; Williams W. Cowans; Glenn W. Zubillaga; Isaac Millian

Archive | 2010

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2010

Method of processing a workpiece in a plasma reactor using feed forward thermal control

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2007

Method and apparatus for gas flow measurement

Jared Ahmad Lee; Ezra Robert Gold; Chunlei Zhang; James P. Cruse; Richard Fovell

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Collaboration

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Douglas A. Buchberger

Applied Materials

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Paul Brillhart

Applied Materials

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Kallol Bera

Drexel University

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Daniel J. Hoffman

Applied Materials

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Douglas H. Burns

Applied Materials

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Hamid Tavassoli

Applied Materials

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Kartik Ramaswamy

Applied Materials

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Kenneth S. Collins

Applied Materials

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Ezra Robert Gold

Applied Materials

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James D. Carducci

Applied Materials

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