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Douglas H. Burns

Applied Materials

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Publication

Featured researches published by Douglas H. Burns.

Archive | 2002

Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor

Keiji Horioka; Chun Yan; Taeho Shin; Roger Alan Lindley; Panyin Hughes; Douglas H. Burns; Evans Lee; Bryan Pu; Qi Li; Mahmoud Dahimene

Archive | 2005

Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output

Jang Gyoo Yang; Daniel J. Hoffman; Steven Shannon; Douglas H. Burns; Wonseok Lee; Kwang-Soo Kim

Archive | 2006

Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Method to reduce plasma-induced charging damage

Michael C. Kutney; Daniel J. Hoffman; Gerardo A. Delgadino; Ezra Robert Gold; Ashok K. Sinha; Xiaoye Zhao; Douglas H. Burns; Shawming Ma

Archive | 2004

Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent

Daniel J. Hoffman; Jang Gyoo Yang; Douglas A. Buchberger; Douglas H. Burns

Archive | 2002

Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber

Keiji Horioka; Chun Yan; Taeho Shin; Roger Alan Lindley; Qi Li; Panyin Hughes; Douglas H. Burns; Evans Lee; Bryan Pu

Archive | 2010

Capacitively coupled plasma reactor having very agile wafer temperature control

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Method of operating a capacitively coupled plasma reactor with dual temperature control loops

Paul Brillhart; Richard Fovell; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; William W. Cowans; Glenn W. Zubillaga; Isaac Millan

Archive | 2006

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; William W. Cowans; Glenn W. Zubillaga; Isaac Millan

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Collaboration

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Daniel J. Hoffman

Applied Materials

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Douglas A. Buchberger

Applied Materials

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Kallol Bera

Drexel University

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Paul Brillhart

Applied Materials

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Richard Fovell

Applied Materials

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Hamid Tavassoli

Applied Materials

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Jang Gyoo Yang

Applied Materials

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Ezra Robert Gold

Applied Materials

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Michael C. Kutney

Applied Materials

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Glenn W. Zubillaga

Applied Materials

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