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Paul Brillhart

Applied Materials

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Publication

Featured researches published by Paul Brillhart.

Archive | 2006

Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2006

Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2010

Capacitively coupled plasma reactor having very agile wafer temperature control

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

Archive | 2006

Method of operating a capacitively coupled plasma reactor with dual temperature control loops

Paul Brillhart; Richard Fovell; Douglas A. Buchberger; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; William W. Cowans; Glenn W. Zubillaga; Isaac Millan

Archive | 2006

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; William W. Cowans; Glenn W. Zubillaga; Isaac Millan

Archive | 2006

Method for agile workpiece temperature control in a plasma reactor using a thermal model

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman; Kenneth W. Cowans; Williams W. Cowans; Glenn W. Zubillaga; Isaac Millian

Archive | 2007

Gas flow diffuser

Paul Brillhart; Daniel J. Hoffman; James D. Carducci; Xiaoping Zhou; Matthew L. Miller

Archive | 2006

Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2010

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Douglas A. Buchberger; Paul Brillhart; Richard Fovell; Hamid Tavassoli; Douglas H. Burns; Kallol Bera; Daniel J. Hoffman

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Collaboration

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Daniel J. Hoffman

Applied Materials

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Joseph M. Ranish

Applied Materials

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Kallol Bera

Drexel University

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Richard Fovell

Applied Materials

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Satheesh Kuppurao

Applied Materials

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Douglas A. Buchberger

Applied Materials

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Douglas H. Burns

Applied Materials

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Edric Tong

Applied Materials

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Kin Pong Lo

Applied Materials

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Mehmet Tugrul Samir

Applied Materials

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