Hans Bernhard Pogge

Method for forming isolated regions of silicon utilizing reactive ion etching

Method for forming a narrow dimensioned region on a body

Reactive ion etching method for producing deep dielectric isolation in silicon

Total dielectric isolation utilizing a combination of reactive ion etching, anodic etching, and thermal oxidation

Process of forming recessed dielectric regions in a monocrystalline silicon substrate

Method for making a lateral PNP or NPN with a high gain utilizing reactive ion etching of buried high conductivity regions

METHOD OF FORMING OPENINGS IN MASKS FOR THE PRODUCTION OF SEMICONDUCTOR DEVICES

Lateral PNP or NPN with a high gain

Method for forming recessed dielectric isolation regions in silicon by means of charged and accelerated particles

Process of forming recessed dielectric regions in a silicon substrate