Hans Bernhard Pogge | Researchain

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Publication

Featured researches published by Hans Bernhard Pogge.

Archive | 1977

Method for forming isolated regions of silicon utilizing reactive ion etching

James Allan Bondur; Hans Bernhard Pogge

Archive | 1978

Method for forming a narrow dimensioned region on a body

Hans Bernhard Pogge

Archive | 1977

Reactive ion etching method for producing deep dielectric isolation in silicon

James Allan Bondur; Hans Bernhard Pogge

Archive | 1977

Total dielectric isolation utilizing a combination of reactive ion etching, anodic etching, and thermal oxidation

Hans Bernhard Pogge

Archive | 1980

Process of forming recessed dielectric regions in a monocrystalline silicon substrate

Hans Bernhard Pogge

Archive | 1979

Method for making a lateral PNP or NPN with a high gain utilizing reactive ion etching of buried high conductivity regions

Narasipur G. Anantha; Harsaran Singh Bhatia; Santosh P. Caur; Hans Bernhard Pogge

Archive | 1979

METHOD OF FORMING OPENINGS IN MASKS FOR THE PRODUCTION OF SEMICONDUCTOR DEVICES

Hans Bernhard Pogge

Archive | 1978

Lateral PNP or NPN with a high gain

Narasipur G. Anantha; Harsaran Singh Bhatia; Santosh P. Gaur; Hans Bernhard Pogge

Archive | 1978

Method for forming recessed dielectric isolation regions in silicon by means of charged and accelerated particles

James Allen Bondur; Hans Bernhard Pogge

Archive | 1981

Process of forming recessed dielectric regions in a silicon substrate

Hans Bernhard Pogge

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Harsaran Singh Bhatia

IBM

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James Allan Bondur

IBM

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James Allen Bondur

IBM

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Narasipur G. Anantha

IBM

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Santosh P. Gaur

IBM

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Santosh P. Caur

IBM

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