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Hans-Georg Froehlich

Infineon Technologies

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Publication

Featured researches published by Hans-Georg Froehlich.

Archive | 2004

Method for reducing an overlay error and measurement mark for carrying out the same

Stefan Gruss; Detlef Hofmann; Rainer Pforr; Mario Hennig; Guido Thielscher; Hans-Georg Froehlich

Archive | 2005

Method for correcting structure-size-dependent positioning errors in photolithography

Hans-Georg Froehlich; Manuel Vorwerk; Ansgar Teipel

Archive | 2004

Method for detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor wafer

Lothar Bauch; Stefan Gruss; Ansgar Teipel; Hans-Georg Froehlich

Archive | 2005

Aligning semiconductor wafer using adjustment marks, adds two spaced structural components joined by trench, with sidewalls still detectable after subsequent processing

Heike Drummer; Jens Stäcker; Hans-Georg Froehlich; Stefan Gruss; Ralph Wienhold; Werner Graf

Archive | 2005

Detecting wafer scanner translation fault in photo-lithographic structuring of semiconductor wafer, especially with RAM component, by forming overlay targets in illumination fields and detemining displacement

Stefan Gruss; Manuel Vorwerk; Hans-Georg Froehlich; Raphael Ehrbrecht

Archive | 2005

Overlay measurement structure method e.g. for determining relative off set of two structure switch patters on semiconductor wafer via raster electron microscope

Ansgar Teipel; Stefan Gruss; Hans-Georg Froehlich

Archive | 2005

Verfahren zur Reduzierung eines Überdeckungsfehlers sowie Meßmarke zur Durchführung des Verfahrens

Detlef Hofmann; Mario Hennig; Guido Thielscher; Stefan Gruss; Rainer Pforr; Hans-Georg Froehlich

Archive | 2004

Verfahren zur Korrektur von strukturgrößenabhängigen Platzierungsfehlern bei der photolithographischen Projektion mittels eines Belichtungsapparats und dessen Verwendung A process for correction of feature size dependent placement errors in the projection by means of a photolithographic exposure apparatus and the use thereof

Hans-Georg Froehlich; Ansgar Teipel; Manuel Vorwerk

Archive | 2004

Verfahren zur Korrektur von strukturgrößenabhängigen Platzierungsfehlern bei der photolithographischen Projektion mittels eines Belichtungsapparats und dessen Verwendung

Hans-Georg Froehlich; Ansgar Teipel; Manuel Vorwerk

Archive | 2003

Verfahren zur Reduzierung eines Überdeckungsfehlers A method for reducing an overlay error

Hans-Georg Froehlich; Stefan Gruss; Mario Hennig; Hofmann Detlef; Pforr Rainer; Guido Thielscher

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Collaboration

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Stefan Gruss

Infineon Technologies

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Ansgar Teipel

Infineon Technologies

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Guido Thielscher

Infineon Technologies

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Manuel Vorwerk

Infineon Technologies

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Mario Hennig

Qimonda

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Detlef Hofmann

Infineon Technologies

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Lothar Bauch

Infineon Technologies

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Rainer Pforr

Infineon Technologies

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Heike Drummer

Infineon Technologies

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Jens Stäcker

Infineon Technologies

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