Stefan Gruss
Infineon Technologies
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Publication
Featured researches published by Stefan Gruss.
Metrology, Inspection, and Process Control for Microlithography XVIII | 2004
Stefan Gruss; Ansgar Teipel; Carsten Fuelber; Elyakim Kassel; Mike Adel; Mark Ghinovker; Pavel Izikson
An improved overlay mark design was applied in high end semiconductor manufacturing to increase the total overlay measurement accuracy with respect to the standard box-in-box target. A comprehensive study has been conducted on the basis of selected front-end and back-end DRAM layers (short loop) to characterize contributors to overlay error. This analysis is necessary to keep within shrinking overlay budget requirements.
Archive | 2004
Hans-Georg Fröhlich; Oliver Genz; Werner Graf; Stefan Gruss; Matthias Handke; Percy Heger; Lars Heineck; Antje Laessig; Alexander Reb; Kristin Schupke; Momtchil Stavrev; Mirko Vogt
Archive | 2004
Stefan Gruss; Detlef Hofmann; Rainer Pforr; Mario Hennig; Guido Thielscher; Hans-Georg Froehlich
Archive | 2004
Lothar Bauch; Stefan Gruss; Ansgar Teipel; Hans-Georg Froehlich
Archive | 2005
Heike Drummer; Jens Stäcker; Hans-Georg Froehlich; Stefan Gruss; Ralph Wienhold; Werner Graf
Archive | 2005
Stefan Gruss; Manuel Vorwerk; Hans-Georg Froehlich; Raphael Ehrbrecht
Archive | 2005
Ansgar Teipel; Stefan Gruss; Hans-Georg Froehlich
Archive | 2005
Detlef Hofmann; Mario Hennig; Guido Thielscher; Stefan Gruss; Rainer Pforr; Hans-Georg Froehlich
Archive | 2003
Hans-Georg Froehlich; Stefan Gruss; Mario Hennig; Hofmann Detlef; Pforr Rainer; Guido Thielscher
Archive | 2003
Raphael Ehrbrecht; Hans-Georg Froehlich; Stefan Gruss; Manuel Vorwerk
