Jens Stäcker

Method and apparatus for orienting semiconductor wafers in semiconductor fabrication

Method for determining the relative positional accuracy of two structure elements on a wafer

Method for aligning and exposing a semiconductor wafer

Appliance for transfer of information or structures onto wafer, using stamp with raised structures produced by suitable method, e.g. photolithography in conjunction with etching

Semiconductor wafer alignment method, by correcting optically measured position information for adjustment mark using line profile of adjustment mark

Method for carrying out a double or multiple exposure

Method for fastening substrate at substrate holder involves laying of first side of substrate on substrate holder, setting of first fluid pressure at first sub range of first side of substrate and setting of second fluid pressure

Maske, Maskensubstrathalter und Verfahren zur Durchführung einer Doppel- oder Mehrfachbelichtung mit der Maske und dem Maskensubstrathalter

Method of exposing a semiconductor wafer in an exposer

Photomaske und Verfahren zur Verwendung der Photomaske in einer Belichtungsanlage