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Heike Salz

Advanced Micro Devices

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Publication

Featured researches published by Heike Salz.

Archive | 2007

Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device

Kai Frohberg; Volker Grimm; Sven Mueller; Matthias Lehr; Ralf Richter; Jochen Klais; Martin Mazur; Heike Salz; Joerg Hohage; Matthias Schaller

Archive | 2009

CONTACT TRENCHES FOR ENHANCING STRESS TRANSFER IN CLOSELY SPACED TRANSISTORS

Andy Wei; Jan Hoentschel; Heike Salz

Archive | 2006

SEMICONDUCTOR DEVICE COMPRISING A CONTACT STRUCTURE WITH INCREASED ETCH SELECTIVITY

Ralf Richter; Carsten Peters; Heike Salz; Matthias Schaller

Archive | 2006

TECHNIQUE FOR CREATING DIFFERENT MECHANICAL STRAIN BY A CONTACT ETCH STOP LAYER STACK WITH AN INTERMEDIATE ETCH STOP LAYER

Kai Frohberg; Carsten Peters; Matthias Schaller; Heike Salz

Archive | 2006

Lacquer contamination reducing method, involves forming lacquer mask, which unseals area of deformation induced layer, over layer to cover one transistor, and removing unsealed area of layer from area over another transistor

Kai Frohberg; Volker Grimm; Joerg Hohage; Jochen Klais; Matthias Lehr; Martin Mazur; Sven Mueller; Ralf Richter; Heike Salz; Matthias Schaller

Archive | 2010

Kontaktgräben zur besseren Verspannungsübertragung in Transistoren mit geringem Abstand

Andy Wei; Jan Hoentschel; Heike Salz

Archive | 2009

METHOD FOR SELECTIVELY REMOVING A SPACER IN A DUAL STRESS LINER APPROACH

Kai Frohberg; Volker Grimm; Heike Salz; Heike Berthold

Archive | 2006

Method of increasing the etch selectivity in a contact structure of semiconductor devices

Carsten Peters; Heike Salz; Ralf Richter; Matthias Schaller

Archive | 2006

Technique for creating different mechanical strain by forming a contact etch stop layer stack having differently modified intrinsic stress

Kai Frohberg; Carsten Peters; Matthias Schaller; Heike Salz

Archive | 2008

Interlayer dielectric material in a semiconductor device comprising a doublet structure of stressed materials

Ralf Richter; Michael Finken; Joerg Hohage; Heike Salz

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Collaboration

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Matthias Schaller

GlobalFoundries

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Kai Frohberg

Advanced Micro Devices

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Carsten Peters

Advanced Micro Devices

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Ralf Richter

GlobalFoundries

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Ralf Richter

GlobalFoundries

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Volker Grimm

Advanced Micro Devices

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Robert Seidel

GlobalFoundries

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Jochen Klais

Advanced Micro Devices

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Sven Mueller

Advanced Micro Devices

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Sylvio Mattick

Advanced Micro Devices

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