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Dive into the research topics where Hin Yiu Anthony Chung is active.

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Featured researches published by Hin Yiu Anthony Chung.


advanced semiconductor manufacturing conference | 2016

Very sensitive real-time inline process mass spectrometer based on FFT Ion Trap technique

Hin Yiu Anthony Chung; Michel Aliman; Gennady Fedosenko; Alexander Laue; Rüdiger Reuter; Valerie Derpmann; Leonid Gorkhover; Martin Antoni

In this work, we introduce a new, very fast and extremely sensitive inline process mass spectrometry technique based on Fourier-Transform 3D-Quadrupole Ion Trap technology. With this new technology, we have successfully detected sub-ppbV AsH3 and single digit pptV B2H6 dopants in H2 process gases within seconds. Real-time inline measurement at a CVD chamber showed that our technology was capable to detect reaction products, contaminations on the wafer holder and dopant memory effects in real-time. In contrast to typical residual gas analyzers, our new 3D-Quadrupole Ion Trap did not show mass discrimination with increasing m/z-ratio and was therefore capable to detect large molecules with very low concentrations.


Archive | 2008

Method for producing facet mirrors and projection exposure apparatus

Berndt Warm; Sigfried Rennon; Udo Dinger; Juergen Baier; Stefan Burkart; Christos Kourouklis; Hin Yiu Anthony Chung; Stefan Wiesner; Hartmut Enkisch; Guenther Dengel


Archive | 2011

EUV Lithography Device and Method For Processing An Optical Element

Wolfgang Singer; Yim-Bun-Patrick Kwan; Stefan-Wolfgang Schmidt; Dirk Heinrich Ehm; Dieter Kraus; Stefan Wiesner; Stefan Koehler; Almut Czap; Hin Yiu Anthony Chung


Archive | 2008

Method and system for removing contaminants from a surface

Dirk Heinrich Ehm; Stefan Schmidt; Dieter Kraus; Stefan Wiesner; Stefan Koehler; Almut Czap; Hin Yiu Anthony Chung


Archive | 2010

Cleaning module, EUV lithography device and method for the cleaning thereof

Stefan Hembacher; Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Koehler; Almut Czap; Stefan Wiesner; Hin Yiu Anthony Chung


Archive | 2016

MASS SPECTROMETER, USE THEREOF, AND METHOD FOR THE MASS SPECTROMETRIC EXAMINATION OF A GAS MIXTURE

Gennady Fedosenko; Michel Aliman; Hin Yiu Anthony Chung; Albrecht Ranck; Leonid Gorkhover


Archive | 2012

Component of an EUV or UV lithography apparatus and method for producing it

Hin Yiu Anthony Chung


Archive | 2011

Method for avoiding contamination and euv-lithography-system

Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Wiesner; Almut Czap; Stefan Koehler; Hin Yiu Anthony Chung


Archive | 2010

Verfahren zur kontaminationsvermeidung und euv-lithographieanlage

Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Wiesner; Almut Czap; Stefan Koehler; Hin Yiu Anthony Chung


Archive | 2009

Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung

Stefan Hembacher; Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Köhler; Almut Czap; Stefan Wiesner; Hin Yiu Anthony Chung

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