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Dirk Heinrich Ehm

Carl Zeiss AG

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Featured researches published by Dirk Heinrich Ehm.

Archive | 2013

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY, AS WELL AS REFLECTIVE OPTICAL ELEMENT WITH REDUCED CONTAMINATION

Dirk Heinrich Ehm; Stephan Muellender; Thomas Stein; Johannes Hubertus Josephina Moors; Dieter Kraus; Richard Versluis; Marcus Gerhardus Hendrikus Meijerink

Archive | 2007

Method for removing a contamination layer from an optical surface, method for generating a cleaning gas, and corresponding cleaning and cleaning...

Arnold Storm; Dirk Heinrich Ehm; Johannes Hubertus Josephina Moors; Thomas Stein; Sligte Edwin Te

Archive | 2010

Cleaning module and euv lithography device with cleaning module

Dirk Heinrich Ehm; Julian Kaller; Stefan Schmidt; Dieter Kraus; Stefan Wiesner; Almut Czap; Hin-Yiu Anthony Chung; Stefan Koehler

Archive | 2010

Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor

Dirk Heinrich Ehm; Arnold Storm; Johannes Hubertus Josephina Moors; Thomas Stein; Edwin te Sligte

Archive | 2010

Particle cleaning of optical elements for microlithography

Dirk Heinrich Ehm; Arnoldus Jan Storm; Johannes Hubertus Josephina Moors; Almut Czap; Mona Nagel; Jacques Cor Johan Van der Donck; Jetske Stortelder; Marijn Sandtke; Maria Isabel Catalina Caballero; Luigi Scaccabarozzi

Archive | 2007

OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HEATED OPTICAL ELEMENT, OPERATING METHODS, AND METHODS FOR CLEANING AS WELL AS FOR PROVIDING AN OPTICAL ELEMENT

Dirk Heinrich Ehm; Annemieke Van De Runstraat; Arnoldus Jan Storm; Thomas Stein; Marco G. H. Meijerink; A. G. Ton M. Bastein; Esther L.J. Van Soest-Vercammen; Norbertus Benedictus Koster; Frits G.H.M. Gubbels; Peter J. Oprel; Michiel Nienoord; Michel Riepen; Johannes Hubertus Josephina Moors

Archive | 2011

EUV Lithography Device and Method For Processing An Optical Element

Wolfgang Singer; Yim-Bun-Patrick Kwan; Stefan-Wolfgang Schmidt; Dirk Heinrich Ehm; Dieter Kraus; Stefan Wiesner; Stefan Koehler; Almut Czap; Hin Yiu Anthony Chung

Archive | 2010

Reflektives optisches Element und Verfahren zu dessen Herstellung

Maarten van Kampen; Dirk Heinrich Ehm; Rogier Verberk; Jeroen Huijbregtse

Archive | 2008

Method and system for removing contaminants from a surface

Dirk Heinrich Ehm; Stefan Schmidt; Dieter Kraus; Stefan Wiesner; Stefan Koehler; Almut Czap; Hin Yiu Anthony Chung

Archive | 2012

Verfahren zum Optimieren eines Schutzlagensystems für ein optisches Element, optisches Element und optisches System für die EUV-Lithographie

Dirk Heinrich Ehm; Arnoldus Jan Storm; Tina Graber; Jeroen Huijbregtse; Edwin te Sligte; Hermanus Hendricus Petrus Theodorus

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Stefan-Wolfgang Schmidt

Carl Zeiss AG

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Dieter Kraus

Carl Zeiss AG

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Gisela von Blanckenhagen

Carl Zeiss AG

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Moritz Becker

Carl Zeiss AG

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Johannes Hubertus Josephina Moors

ASML Holding

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Stefan Wiesner

Carl Zeiss AG

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Thomas Stein

Carl Zeiss AG

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Edwin te Sligte

Carl Zeiss AG

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Almut Czap

Carl Zeiss AG

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Arnoldus Jan Storm

Carl Zeiss AG

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