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Stefan Wiesner

Carl Zeiss AG

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Publication

Featured researches published by Stefan Wiesner.

Archive | 2008

Method for producing facet mirrors and projection exposure apparatus

Berndt Warm; Sigfried Rennon; Udo Dinger; Juergen Baier; Stefan Burkart; Christos Kourouklis; Hin Yiu Anthony Chung; Stefan Wiesner; Hartmut Enkisch; Guenther Dengel

Archive | 2010

Cleaning module and euv lithography device with cleaning module

Dirk Heinrich Ehm; Julian Kaller; Stefan Schmidt; Dieter Kraus; Stefan Wiesner; Almut Czap; Hin-Yiu Anthony Chung; Stefan Koehler

Archive | 2011

EUV Lithography Device and Method For Processing An Optical Element

Wolfgang Singer; Yim-Bun-Patrick Kwan; Stefan-Wolfgang Schmidt; Dirk Heinrich Ehm; Dieter Kraus; Stefan Wiesner; Stefan Koehler; Almut Czap; Hin Yiu Anthony Chung

Archive | 2008

Method and system for removing contaminants from a surface

Dirk Heinrich Ehm; Stefan Schmidt; Dieter Kraus; Stefan Wiesner; Stefan Koehler; Almut Czap; Hin Yiu Anthony Chung

Archive | 2009

Method and device for connecting an optical element to a frame

Armin Schoeppach; Johnannes Rau; Gennady Fedosenko; Leonid Gorkhover; Gerd Klose; Stefan Wiesner; Hans-Joachim Trefz; Michael Widmann; Ulrich Bingel; Claudia Ekstein; Guenter Albrecht

Archive | 2010

Cleaning module, EUV lithography device and method for the cleaning thereof

Stefan Hembacher; Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Koehler; Almut Czap; Stefan Wiesner; Hin Yiu Anthony Chung

Archive | 2003

Method and device for decontaminating optical surfaces

Jens Luedecke; Christoph Zazcek; Alexandra Pazidis; Jens Ullmann; Annette Muehlpfordt; Michael Thier; Stefan Wiesner

Archive | 2006

Method for connecting an optical element with a fitting on at least one connecting site used in semiconductor lithography comprises indirectly or directly positioning the element and the fitting during connection using a support element

Günter Albrecht; Ulrich Bingel; Claudia Ekstein; Gennady Fedosenko; Leonid Gorkhover; Gerd Klose; Johannes Rau; Armin Schöppach; Hans-Jochaim Trefz; Michael Widmann; Stefan Wiesner

Archive | 2003

Method and device for the decontamination of optical surfaces

Jens Lüdecke; Christoph Zazcek; Alexandra Pazidis; Jens Ullmann; Annette Mühlpfordt; Michael Thier; Stefan Wiesner

Archive | 2011

Method for avoiding contamination and euv-lithography-system

Dieter Kraus; Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Stefan Wiesner; Almut Czap; Stefan Koehler; Hin Yiu Anthony Chung

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Collaboration

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Dieter Kraus

Carl Zeiss AG

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Dirk Heinrich Ehm

Carl Zeiss AG

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Hin Yiu Anthony Chung

Carl Zeiss AG

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Almut Czap

Carl Zeiss AG

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Stefan Koehler

Carl Zeiss AG

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Stefan-Wolfgang Schmidt

Carl Zeiss AG

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Claudia Ekstein

Carl Zeiss AG

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Gennady Fedosenko

Carl Zeiss AG

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Leonid Gorkhover

Carl Zeiss AG

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Michael Widmann

Carl Zeiss AG

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