Hiroshi Sakuma | Researchain

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Featured researches published by Hiroshi Sakuma.

Archive | 1998

Semiconductor integrated circuit device in which a conductive film is formed over a trap film which in turn is formed over a titanium film

Yoshitaka Nakamura; Tsuyoshi Tamaru; Naoki Fukuda; Hidekazu Goto; Isamu Asano; Hideo Aoki; Keizo Kawakita; Satoru Yamada; Katsuhiko Tanaka; Hiroshi Sakuma; Masayoshi Hirasawa

Archive | 2003

Semiconductor integrated circuit device with capacitor of crown structure and method of manufacturing the same

Shinpei Iijima; Hiroshi Sakuma

Archive | 2003

Method for fabricating semiconductor integrated circuit

Yoshitaka Nakamura; Tsuyoshi Tamaru; Naoki Fukuda; Hidekazu Goto; Isamu Asano; Hideo Aoki; Keizo Kawakita; Satoru Yamada; Katsuhiko Tanaka; Hiroshi Sakuma; Masayoshi Hirasawa

Archive | 2004

Method for forming a metal oxide film

Kenichi Koyanagi; Hiroshi Sakuma

Archive | 2006

MEMORY WITH MEMORY CELLS THAT INCLUDE A MIM TYPE CAPACITOR WITH A LOWER ELECTRODE MADE FOR REDUCED RESISTANCE AT AN INTERFACE WITH A METAL FILM

Yoshitaka Nakamura; Hidekazu Goto; Isamu Asano; Mitsuhiro Horikawa; Keiji Kuroki; Hiroshi Sakuma; Kenichi Koyanagi; Tsuyoshi Kawagoe

Archive | 2004

Method for forming metal oxide-film

Kenichi Koyanagi; Hiroshi Sakuma

Archive | 2003

Semiconductor integrated circuit device and its fabricating method

Isamu Asano; Masahiko Hiratani; Shinpei Iijima; Yoshitaka Nakamura; Hiroshi Sakuma; 吉孝中村; 浩佐久間; 正彦平谷; 勇浅野; 晋平飯島

Archive | 2004

Semiconductor integrated circuit device having a conductive film which contains metal atoms bondable to a halogen element

Yoshitaka Nakamura; Tsuyoshi Tamaru; Naoki Fukuda; Hidekazu Goto; Isamu Asano; Hideo Aoki; Keizo Kawakita; Satoru Yamada; Katsuhiko Tanaka; Hiroshi Sakuma; Masayoshi Hirasawa

Archive | 2004

Verfahren zum Bilden eines Metalloxidfilmes A method of forming a metal oxide film

Kenichi Koyanagi; Hiroshi Sakuma

The Japan Society of Applied Physics | 2003

Low Resistive Contacts of TiN-Barrier and Ru-Electrode Using PCM Sputtering for MIM-Ta2O5 Capacitors in Giga-Bit DRAMs

Yoshitaka Nakamura; Tsuyoshi Kawagoe; Hiroshi Sakuma; Hiromu Yamaguchi; Isamu Asano; Mitsuhiro Horikawa; Keiji Kuroki; Kenji Tanaka; Yasuhiko Ueda; Hidekazu Goto

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