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Dive into the research topics where Hiroyuki Miyazawa is active.

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Featured researches published by Hiroyuki Miyazawa.


IEEE Journal of Solid-state Circuits | 1990

A 23-ns 1-Mb BiCMOS DRAM

Goro Kitsukawa; Kazumasa Yanagisawa; Yutaka Kobayashi; Yoshitaka Kinoshita; Tatsuyuki Ohta; Tetsu Udagawa; Hitoshi Miwa; Hiroyuki Miyazawa; Yoshiki Kawajiri; Yoshiaki Ouchi; Hiromi Tsukada; Tetsuro Matsumoto; Kiyoo Itoh

A 1-Mb BiCMOS DRAM having a 23-ns access time is described. The DRAM uses a direct sensing technique and a nonaddress-multiplexing configuration. This technique combines the NMOS differential circuit on each pair of data lines with a common highly sensitive bipolar circuit. The resulting chip has been verified to have high-speed characteristics while maintaining a wide operating margin and a relatively small chip size of 62.2 mm/sup 2/, in spite of a 1.3- mu m lithography level. >


european solid state circuits conference | 1989

A 23ns 1Mbit BiCMOS DRAM

Kazumasa Yanagisawa; Goro Kitsukawa; Yutaka Kobayashi; Yoshitaka Kinoshita; Tatsuyuki Ohta; Tetsu Udagawa; Kyoko Ishii; Hitoshi Miwa; Hiroyuki Miyazawa; Yoshiaki Ouchi; Hiromi Tsukada; Tetsuro Matsumoto; Kiyoo Itoh

I -_JLd Lioduction Bit density oi DRAMs has continued to be improved by a factor of four times every three years. In contrast with these remarkable improvemenls in bit densitv, improvements in access and cycle times of DRAMs available in the market are insufficient for higher performance applications. For improving DRAM speed with reasonable process complexity, a 1.3ßm 1Mbit BiCMOS DRAM has been reported (I). However, performance of the previous DRAM is insufficient, although BiCMOS technology was verified as having advantages for improving speed, power dissipation and soft error rate (2)(3). In this paper, a 23ns 1.3 fi m 1Mbit BiCMOS DRAM, suitable for imss production, is described. First, high-speed sensing circuit techniques combined with a non


IEEE Journal of Solid-state Circuits | 1992

A wafer-scale-level system integrated LSI containing eleven 4-Mb DRAMs, six 64-kb SRAMs, and an 18 K-gate array

Katsuyuki Sato; M. Kobayashi; H. Hida; Hiroyuki Miyazawa; Y. Shirai; K. Fujita; T. Nakao; M. Ishihara

A system integrated LSI chip (SLSI) that contains eleven 4-Mb DRAMs, six 64-kb SRAMs, and an 18 K-gate array, for a graphics application system is described. To implement the SLSI on a silicon chip, three key techniques have been developed: (1) system redundancy for defect relief; (2) chip configuration and fabrication with blade masking to achieve a hybrid 38.16*50.4-mm/sup 2/ chip; and (3) large-capability and high-reliability 324-pin 54*86-mm/sup 2/ plastic pin grid array package. Using a system redundancy technique, a 60% yield for the SLSI is achieved with a 40% yield for the DRAM itself. That is twice the 30% yield of the conventional repair scheme. Access times are 65 ns for the DRAM and 14 ns for the SRAM with a 3.9-W chip power dissipation. >


Archive | 1996

Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same

Jun Murata; Yoshitaka Tadaki; Hiroko Kaneko; Toshihiro Sekiguchi; Hiroyuki Uchiyama; Hisashi Nakamura; Toshio Maeda; Osamu Kasahara; Hiromichi Enami; Atsushi Ogishima; Masaki Nagao; Michimasa Funabashi; Yasuo Kiguchi; Masayuki Kojima; Atsuyoshi Koike; Hiroyuki Miyazawa; Masato Sadaoka; Kazuya Kadota; Tadashi Chikahara; Kazuo Nojiri; Yutaka Kobayashi


Archive | 1993

Method of making a semiconductor memory circuit device

Naokatsu Suwanai; Hiroyuki Miyazawa; Atushi Ogishima; Masaki Nagao; Kyoichiro Asayama; Hiroyuki Uchiyama; Yoshiyuki Kaneko; Takashi Yoneoka; Kozo Watanabe; Kazuya Endo; Hiroki Soeda


Archive | 1991

Semiconductor memory circuit device and method for fabricating same

Naokatsu Suwanai; Hiroyuki Miyazawa; Atushi Ogishima; Masaki Nagao; Kyoichiro Asayama; Hiroyuki Uchiyama; Yoshiyuki Kaneko; Takashi Yoneoka; Kozo Watanabe; Kazuya Endo; Hiroki Soeda


Archive | 1988

Semiconductor device including an improved trench arrangement

Yutaka Kobayashi; Akihiro Tanba; Ryoichi Hori; Kyoichiro Asayama; Seigoh Yukutake; Hiroyuki Miyazawa; Kazumasa Yanagisawa; Goro Kitsukawa


Archive | 1990

Method for producing semiconductor integrated circuit device

Kyoichiro Asayama; Hiroyuki Miyazawa; Yutaka Kobayashi; Seigou Yukutake


Archive | 1991

Semiconductor integrated circuit device including a dielectric breakdown prevention circuit

Jun Murata; Hideyuki Miyazawa; Kyoichiro Asayama; Akihiro Tamba; Seigou Yukutake; Hiroyuki Miyazawa; Yutaka Kobayashi; Tomoyuki Someya


Archive | 1983

Composite conductor structure for semiconductor devices

Osamu Kasahara; Shinji Shimizu; Hiroyuki Miyazawa; Kensuke Nakata

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