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Dive into the research topics where Holger Kierey is active.

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Featured researches published by Holger Kierey.


Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications | 2004

EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing

Holger Kierey; Klaus Heidemann; Bernd Kleemann; Renate Winters; Wilhelm Egle; Wolfgang Singer; Frank Melzer; Rutger Wevers; Martin Antoni

The radiation emitted from an EUV source is collected and focused by a suitable collector system. A reflective blazed grating is used in -1st diffraction order to select a definite spectral band around 13.5 nm wavelength from the broad-band emission spectrum of the source. The effective grating area is segmented into a set of different plane gratings, mounted on a common base plate. In order to focus the light from the collector system, the grating segments are tilted and form a best-fit polygon surface. A specific groove density variation on the grating segments significantly improves the imaging performance. In this paper, we report on design, fabrication and testing of the grating system.


Optics Letters | 2004

Record high extreme-ultraviolet efficiency at near-normal incidence from a multilayer-coated polymer-overcoated blazed ion-etched holographic grating.

M. P. Kowalski; R. G. Cruddace; Klaus Heidemann; Ralf Lenke; Holger Kierey; Troy W. Barbee; W. R. Hunter

We have measured the extreme-ultraviolet (EUV) efficiency of a polymer-overcoated blazed ion-etched holographic test grating. The grating had a magnetron-sputtered Mo2C/Si multilayer coating matched to the grating blaze angle of 2.78 degrees. At an angle of incidence of 5.6 degrees and a wavelength of 15.79 nm, the measured efficiency peaks in the second outside order at 29.9%. The derived groove efficiency is 53.0%. To the best of our knowledge these are the highest values obtained yet at EUV wavelengths from a holographic ion-etched blazed grating.


Proceedings of SPIE | 2004

High-efficiency multilayer-coated polymer-overcoated blazed ion-etched holographic gratings for high-resolution EUV astronomical spectroscopy

M. P. Kowalski; R. G. Cruddace; Troy W. Barbee; W. R. Hunter; Klaus Heidemann; Bruno Nelles; Ralf Lenke; Holger Kierey

We have measured the topography and near-normal incidence EUV efficiency of five flat multilayer-coated polymer-overcoated blazed ion-etched holographic test gratings. Blaze angles were in the range 2.0-4.1°. All gratings had a surface roughness <3 Å rms (20-4000 Å). The best grating had a measured efficiency of 29.9% in the second order at 157.9 Å and a derived groove efficiency of 53.0%. At the shortest wavelength investigated (100.0 Å) another grating produced a measured efficiency in the first order of 12.9% and a derived groove efficiency of 33.6%. In third order another grating produced a measured efficiency at 137.8 Å of 13.4% and a derived groove efficiency of 21.8%. To the best of our knowledge these values exceed previous published results. Some issues remain that may be associated with modification of the groove profile by the multilayer coating.


Archive | 2011

Reflektives optisches Element zur Verwendung in einem EUV-System

Holger Kierey; Michel Le Maire; Willi Anderl; Hubert Holderer; Anton Lengel


Archive | 2010

REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM

Holger Kierey; Michel Le Maire; Willi Anderl; Hubert Holderer; Anton Lengel


Archive | 2012

Optische Anordnung für eine EUV-Projektionsbelichtungsanlage sowie Verfahren zum Kühlen eines optischen Bauelements

Willi Anderl; Holger Kierey; Markus Bauer; Severin Waldis; András G. Major


Archive | 2013

Method for producing a reflective optical component for an euv projection exposure apparatus and component of this type

Holger Kierey; Heiko Siekmann; Andre Bresan


Archive | 2004

Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed grating

Klaus Heidemann; Holger Kierey; Bruno Nelles


Archive | 2013

Method for repairing optical elements, and optical element

Oli Ehrler; Uwe Meier; Alexander Uhl; Holger Kierey


Archive | 2006

Optical devices and related systems and methods

Vitaliy Shklover; Holger Kierey; Holger Muenz; Michel Le Maire; Bernhard Weigl

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