Hugo Águas

Growth of ZnO:Ga thin films at room temperature on polymeric substrates: thickness dependence

In this paper, we present results concerning the thickness dependence (from 70 to 890 nm) of electrical, structural, morphological and optical properties presented by gallium-doped zinc oxide (GZO) deposited on polyethylene naphthalate (PEN) substrates by r.f. magnetron sputtering at room temperature. For thicknesses higher than 300 nm an independent correlation between the electrical, morphological, structural and optical properties are observed. The lowest resistivity obtained was 5 =10 V cm with y4 a sheet resistance of 15 Vyh and an average optical transmittance in the visible part of the spectra of 80%. It is also shown that by passivating the surface of the polymer by depositing a thin silicon dioxide layer the electrical and structural properties of the films are improved nearly by a factor of two. 2003 Elsevier B.V. All rights reserved.

New challenges on gallium-doped zinc oxide films prepared by r.f. magnetron sputtering

Abstract Gallium-doped zinc oxide films were prepared by r.f. magnetron sputtering at room temperature as a function of the substrate–target distance. The best results were obtained for a distance of 10 cm, where a resistivity as low as 2.7×10 −4 Ω cm, a Hall mobility of 18 cm 2 /Vs and a carrier concentration of 1.3×10 21 cm −3 were achieved. The films are polycrystalline presenting a strong crystallographic c -axis orientation (002) perpendicular to the substrate. The films present an overall transmittance in the visible part of the spectra of approximately 85%, on average.

Flexible a-Si:H Position-Sensitive Detectors

Flexible and large area (5 mm /spl times/80 mm with an active length of 70 mm) position-sensitive detectors (PSDs) deposited onto polymeric substrates (polyimide-Kapton VN) have been fabricated. The optimized structure presented is based on a heterojunction of amorphous silicon (a-Si:H)/ZnO:Al. The sensors were characterized by spectral response, photocurrent dependence as a function of light intensity, and position detection measurements. The set of data obtained on one-dimensional PSDs based on the heterojunction show excellent performances with a maximum spectral response of 0.12 A/W at 500 nm and a nonlinearity of /spl plusmn/10% over 70-mm length. The produced sensors present a nonlinearity higher than those ones produced on glass substrates, due to the different thermal coefficients exhibited by the polymer and the a-Si:H film. In order to prove this behavior, it was measured the defect density obtained by the constant photocurrent method on a-Si:H thin films deposited on polymeric substrates and bent with different radii of curvature.

Transparent, conductive ZnO:Al thin film deposited on polymer substrates by RF magnetron sputtering

In this paper, we present the optical, electrical, structural and mechanical properties exhibited by aluminum-doped zinc oxide (ZnO:Al) thin films produced by RF magnetron sputtering on polymeric substrates (polyethylene terephthalate, PET; Mylar type D from Dupont®) with a standard thickness of 100 μm. The influence of the uniaxial tensile strain on the electrical resistance of these films was evaluated in situ for the first time during tensile elongation. In addition, the role of the thickness on the mechanical behavior of the films was also evaluated. The preliminary results reveal that the increase in electrical resistance is related to the number of cracks, as well as the crack width, which also depends on the film thickness.

Influence of the layer thickness in plasmonic gold nanoparticles produced by thermal evaporation

Metallic nanoparticles (NPs) have received recently considerable interest of photonic and photovoltaic communities. In this work, we report the optoelectronic properties of gold NPs (Au-NPs) obtained by depositing very thin gold layers on glass substrates through thermal evaporation electron-beam assisted process. The effect of mass thickness of the layer was evaluated. The polycrystalline Au-NPs, with grain sizes of 14 and 19 nm tend to be elongated in one direction as the mass thickness increase. A 2 nm layer deposited at 250°C led to the formation of Au-NPs with 10-20 nm average size, obtained by SEM images, while for a 5 nm layer the wide size elongates from 25 to 150 nm with a mean at 75 nm. In the near infrared region was observed an absorption enhancement of amorphous silicon films deposited onto the Au-NPs layers with a corresponding increase in the PL peak for the same wavelength region.

Nanostructured silicon and its application to solar cells, position sensors and thin film transistors

This paper reports the performance of small area solar cells, 128 linear integrated position sensitive detector arrays and thin film transistors based on nanostructured silicon thin films produced by plasma-enhanced chemical vapour deposition technique, close to the onset of dusty plasma conditions, within the transition region from amorphous to microcrystalline. The small area solar cells, produced in a modified single chamber reactor, exhibited very good electrical characteristics with a conversion efficiency exceeding 9%. The 128 integrated position sensitive detector arrays, based on a similar pin structure, allow real-time 3D object imaging with a resolution higher than 90 l p/mm. The thin film transistors produced exhibited field effect mobility of 2.47 cm2/V/s, threshold voltage of 2 V, on/off ratio larger than 107 and sub-threshold slopes of 0.32 V/decade, which are amongst the best results reported for this type of device.

Silicon thin film solar cells on commercial tiles

Nanostructured silicon single junction thin film solar cells were deposited on commercial red clay roof tiles with engobe surfaces and earthenware wall tiles with glazed surfaces, with a test area of 24 mm2. We studied the influence of the type of substrate tile, back contact, buffer layer and SiOx passivation layer on the optoelectronic performance of the solar cells. Despite the fact that typical micrometre-sized defects on the surfaces of the tiles and the porous nature of the ceramic substrates make deposition of homogeneous thin films on them quite challenging, we have been able to achieve a cell efficiency of 5% and a quantum efficiency of 80% on non-fully optimized cells on commercial tiles. The method is industrially employable utilizing pre-existing plasma-enhanced chemical vapour deposition technologies. The cost-effectiveness and industrial feasibility of the technique are discussed. Our study shows that photovoltaic tiles can combine energy generation with architectural aesthetics leading to significant implications for advancement in building integrated photovoltaics.

Large Area Deposition of Polymorphous Silicon by Plasma Enhanced Chemical Vapor Deposition at 27.12 MHz and 13.56 MHz

This work presents for the first time a study on the deposition of polymorphous silicon at an excitation frequency of 27.12 MHz in a large-area plasma enhanced chemical vapor deposition (PECVD) reactor. Moreover, the films produced at 13.56 MHz were also investigated to compare their performance with that of the films produced at 27.12 MHz. The SiH4/H2 plasma was characterized by impedance probe measurements, aiming to identify the plasma conditions that lead to produce polymorphous films, under quasi-isothermal conditions. The films were characterized by spectroscopic ellipsometry, infrared absorption, Raman spectroscopy, and hydrogen exodiffusion experiments. These techniques enable a detailed structural characterization of the polymorphous films and a study of the differences between the films deposited at 27.12 MHz and 13.56 MHz. Conductivity measurements were also performed to determine the transport properties of the films. The results show that by using a 27.12 MHz frequency, the growth rate increased by 70% and a more stable, relaxed and denser structure was obtained.

Bio-microfluidic platform for gold nanoprobe based DNA detection--application to Mycobacterium tuberculosis.

We have projected and fabricated a microfluidic platform for DNA sensing that makes use of an optical colorimetric detection method based on gold nanoparticles. The platform was fabricated using replica moulding technology in PDMS patterned by high-aspect-ratio SU-8 moulds. Biochips of various geometries were tested and evaluated in order to find out the most efficient architecture, and the rational for design, microfabrication and detection performance is presented. The best biochip configuration has been successfully applied to the DNA detection of Mycobacterium tuberculosis using only 3 µl on DNA solution (i.e. 90 ng of target DNA), therefore a 20-fold reduction of reagents volume is obtained when compared with the actual state of the art.

New insights on large area flexible position sensitive detectors

Abstract In this paper we present an improved version of large area (5 mm ×80 mm ) flexible position sensitive detectors deposited on polyimide (Kapton ® VN) substrates with 75 μm thickness, produced by plasma enhanced chemical vapor deposition (PECVD). The structures presented by the sensors are Kapton/ZnO:Al/(pin)a-Si:H/Al and the heterostructure Kapton/Cr/(in)a-Si:H/ZnO:Al. These sensors were characterized by spectral response, photocurrent dependence as a function of light intensity and position detectability measurements. The set of data obtained on one-dimensional position sensitive detectors based on the heterostructure show excellent performances with a maximum spectral response of 0.12 A/W at 500 nm and a non-linearity of ±10%.