Igor Y. Khandros
IBM
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Publication
Featured researches published by Igor Y. Khandros.
Journal of Vacuum Science and Technology | 1989
Igor Y. Khandros; Robert J. Baseman; Curtis E. Farrell; Chung‐Y. Ting
A novel and effective technique for fabricating metal surfaces with controlled topography is described. The metal of interest is deposited onto a thin (25–200 A) underlayer of a liquid metal. Transient liquid reactions during film growth and coalescence lead to characteristic roughening of the deposits. Studies of 1‐μm Al films deposited on thin Ga underlayers revealed a consistent increase of the size of Al features with the average thickness of the Ga underlayer. No apparent change in the films’ resistivity was detected. Limited studies of 1‐μm Cu films with a Ga underlayer suggest the general applicability of this technique.
Archive | 1993
Igor Y. Khandros; Thomas H. DiStefano
Archive | 2000
Igor Y. Khandros; Thomas H. DiStefano
Archive | 1995
H. Dozier Ii Thomas; Benjamin N. Eldridge; Gary W. Grube; Igor Y. Khandros; Gaetan L. Mathieu
Archive | 1991
Igor Y. Khandros; Thomas H. DiStefano
Archive | 1997
Igor Y. Khandros; Benjamin N. Eldridge; Gaetean L. Mathieu; Thomas H. Dozier; William D. Smith
Archive | 1995
Benjamin N. Eldridge; Gary W. Grube; Igor Y. Khandros; Gaetan L. Mathieu
Archive | 2001
Benjamin N. Eldridge; Gary W. Grube; Igor Y. Khandros; Gaetan L. Mathieu
Archive | 2008
Igor Y. Khandros; David V. Pedersen
Archive | 2001
Benjamin N. Eldridge; Gary W. Grube; Igor Y. Khandros; Gaetan L. Mathieu
