Jan-Hindrik Schulze

Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography

The success of advanced quantum communication relies crucially on non-classical light sources emitting single indistinguishable photons at high flux rates and purity. We report on deterministically fabricated microlenses with single quantum dots inside which fulfil these requirements in a flexible and robust quantum device approach. In our concept we combine cathodoluminescence spectroscopy with advanced in situ three-dimensional electron-beam lithography at cryogenic temperatures to pattern monolithic microlenses precisely aligned to pre-selected single quantum dots above a distributed Bragg reflector. We demonstrate that the resulting deterministic quantum-dot microlenses enhance the photon-extraction efficiency to (23±3)%. Furthermore we prove that such microlenses assure close to pure emission of triggered single photons with a high degree of photon indistinguishability up to (80±7)% at saturation. As a unique feature, both single-photon purity and photon indistinguishability are preserved at high excitation power and pulsed excitation, even above saturation of the quantum emitter.The prospect of realizing building blocks for long-distance quantum communication is a major driving force for the development of advanced nanophotonic devices. Significant progress has been achieved in this field with respect to the fabrication of efficient quantum-dot-based single-photon sources. More recently, even spin-photon entanglement and quantum teleportation have been demonstrated in semiconductor systems. These results are considered as crucial steps towards the realization of a quantum repeater. The related work has almost exclusively been performed on self-assembled quantum dots (QDs) and random device technology. At this point it is clear that further progress in this field towards real applications will rely crucially on deterministic device technologies which will, for instance, enable the processing of bright quantum light sources with pre-defined emission energy. Here we report on enhanced photon-extraction efficiency from monolithically integrated microlenses which are coupled deterministically to single QDs. The microlenses with diameters down to 800 nm were aligned to single QDs by in-situ electron-beam lithography using a low-temperature cathodoluminescence setup. This deterministic device technology allowed us to obtain an enhancement of photon extraction efficiency for QDs integrated into microlenses as compared to QDs in unstructured surfaces. The excellent optical quality of the structures is demonstrated by cathodoluminescence and micro-photoluminescence spectroscopy. A Hong-Ou-Mandel experiment states the emission of single indistinguishable photons.

In situ electron-beam lithography of deterministic single-quantum-dot mesa-structures using low-temperature cathodoluminescence spectroscopy

We report on the deterministic fabrication of sub-μm mesa-structures containing single quantum dots (QDs) by in situ electron-beam lithography. The fabrication method is based on a two-step lithography process: After detecting the position and spectral features of single InGaAs QDs by cathodoluminescence (CL) spectroscopy, circular sub-μm mesa-structures are defined by high-resolution electron-beam lithography and subsequent etching. Micro-photoluminescence spectroscopy demonstrates the high optical quality of the single-QD mesa-structures with emission linewidths below 15 μeV and g(2)(0) = 0.04. Our lithography method has an alignment precision better than 100 nm which paves the way for a fully deterministic device technology using in situ CL lithography.

Electro-optical resonance modulation of vertical-cavity surface-emitting lasers

Optical and electrical investigations of vertical-cavity surface-emitting lasers (VCSEL) with a monolithically integrated electro-optical modulator (EOM) allow for a detailed physical understanding of this complex compound cavity laser system. The EOM VCSEL light output is investigated to identify optimal working points. An electro-optic resonance feature triggered by the quantum confined Stark effect is used to modulate individual VCSEL modes by more than 20 dB with an extremely small EOM voltage change of less than 100 mV. Spectral mode analysis reveals modulation of higher order modes and very low wavelength chirp of < 0.5 nm. Dynamic experiments and simulation predict an intrinsic bandwidth of the EOM VCSEL exceeding 50 GHz.

Electrically driven single photon source based on a site-controlled quantum dot with self-aligned current injection

Electrical operation of single photon emitting devices employing site-controlled quantum dot (QD) growth is demonstrated. An oxide aperture acting as a buried stressor structure is forcing site-controlled QD growth, leading to both QD self-alignment with respect to the current path in vertical injection pin-diodes and narrow, jitter-free emission lines. Emissions from a neutral exciton, a neutral bi-exciton, and a charged exciton are unambiguously identified. Polarization-dependent measurements yield an exciton fine-structure splitting of (84 ± 2) μeV at photon energies of 1.28–1.29 eV. Single-photon emission is proven by Hanbury Brown and Twiss experiments yielding an anti-bunching value of g(2)(0) = 0.05 under direct current injection.

Single-photon emission at a rate of 143 MHz from a deterministic quantum-dot microlens triggered by a mode-locked vertical-external-cavity surface-emitting laser

We report on the realization of a quantum dot (QD) based single-photon source with a record-high single-photon emission rate. The quantum light source consists of an InGaAs QD which is deterministically integrated within a monolithic microlens with a distributed Bragg reflector as back-side mirror, which is triggered using the frequency-doubled emission of a mode-locked vertical-external-cavity surface-emitting laser (ML-VECSEL). The utilized compact and stable laser system allows us to excite the single-QD microlens at a wavelength of 508 nm with a pulse repetition rate close to 500 MHz at a pulse width of 4.2 ps. Probing the photon statistics of the emission from a single QD state at saturation, we demonstrate single-photon emission of the QD-microlens chip with g(2)(0) < 0.03 at a record-high single-photon flux of (143 ± 16) MHz collected by the first lens of the detection system. Our approach is fully compatible with resonant excitation schemes using wavelength tunable ML-VECSELs, which will optimize ...

Lateral positioning of InGaAs quantum dots using a buried stressor

We present a “bottom-up” approach for the lateral alignment of semiconductor quantum dots (QDs) based on strain-driven self-organization. A buried stressor formed by partial oxidation of (Al,Ga)As layers is employed in order to create a locally varying strain field at a GaAs(001) growth surface. During subsequent strained layer growth, local self-organization of (In,Ga)As QDs is controlled by the contour shape of the stressor. Large vertical separation of the QD growth plane from the buried stressor interface of 150 nm is achieved enabling high optical quality of QDs. Optical characterization confirms narrow QD emission lines without spectral diffusion. V C 2012 American Institute of Physics .[ http://dx.doi.org/10.1063/1.3691251] The deterministic alignment of quantum dots (QDs) during an epitaxial growth process is mandatory for electronic and optoelectronic devices 1 based on single QDs, for example, single photon detectors 2 and non-classical light emitters. 3 The self-organized formation of coherently strained islands, e.g., QDs, by the growth of strained layers in the “Stranski-Krastanow” growth regime is a consequence of the total energy minimization of the strained layer system. 4–6 QDs are formed if the strain energy relieved by island formation surpasses the energy cost associated with newly formed surfaces and edges. 7 Therefore, a selective formation of QDs on a surface will occur if the surface exhibits sites of increased strain energy, higher strain energy relief, or lower facet formation energy during growth of a strained layer. Current techniques for QD positioning generally deploy nanometer-scale lithography techniques like electron beam lithography, 8 focused ion beam lithography, 9 local oxidation, 10 or nano-imprinting 11 in order to define nanometersized areas as exclusive nucleation sites prior to the growth of quantum dots. All these “top-down” approaches share a number of difficulties, which impact the structural and optical properties of the quantum dots. First, deterministic quantum dot nucleation is possible only within very close vertical proximity to the structural patterning. An often reported problem is the missing of QDs at shallow holes patterned on a growth surface. 8,9 Since the patterning involves etching of the surface or other invasive means, the quantum dots will be surrounded by defect sites which degrade their structural and optical quality. 12 Even though sophisticated cleaning

Resolution and alignment accuracy of low-temperature in situ electron beam lithography for nanophotonic device fabrication

The performance of a deterministic lithographic technology to produce a reliable and accurate fabrication of nanophotonic devices based on epitaxial quantum dots is analyzed. Directly after the selection of qualified quantum dots by low-temperature cathodoluminescence spectroscopy in a scanning electron microscope, the in situ electron beam lithography step is performed. In an optimized process flow, quantum dot positions are identified with an accuracy of 25 nm, and a nanoscale alignment accuracy of the device structures of 24 nm for the emitters and one as low as 65 nm for feature sizes is demonstrated. Such accuracies surpass the performance of previously developed optical in situ lithography techniques, making this site control of quantum dots appropriate deterministic quantum device fabrication.

Atomic structure and optical properties of InAs submonolayer depositions in GaAs

Using cross-sectional scanning tunneling microscopy and photoluminescence spectroscopy, the atomic structure and optical properties of submonolayer depositions of InAs in GaAs are studied. The submonolayer depositions are formed by a cycled deposition of 0.5 monolayers InAs with GaAs spacer layers of different thicknesses between 1.5 and 32 monolayers. The microscopy images exhibit InAs-rich agglomerations with widths around 5 nm and heights of up to 8 monolayers. A lateral agglomeration density in the 1012 cm−2 range is found. During the capping of the InAs depositions a vertical segregation occurs, for which a segregation coefficient of ∼0.73 was determined. In the case of thin GaAs spacer layers, the observed segregation forms vertically connected agglomerations. The photoluminescence spectra exhibit peaks with linewidths below 10 meV and show a considerable dependence of the peak energy on the spacer thickness, even up to 32 monolayers GaAs, indicating a long range electronic coupling.Using cross-sectional scanning tunneling microscopy and photoluminescence spectroscopy, the atomic structure and optical properties of submonolayer depositions of InAs in GaAs are studied. The submonolayer depositions are formed by a cycled deposition of 0.5 monolayers InAs with GaAs spacer layers of different thicknesses between 1.5 and 32 monolayers. The microscopy images exhibit InAs-rich agglomerations with widths around 5 nm and heights of up to 8 monolayers. A lateral agglomeration density in the 1012 cm−2 range is found. During the capping of the InAs depositions a vertical segregation occurs, for which a segregation coefficient of ∼0.73 was determined. In the case of thin GaAs spacer layers, the observed segregation forms vertically connected agglomerations. The photoluminescence spectra exhibit peaks with linewidths below 10 meV and show a considerable dependence of the peak energy on the spacer thickness, even up to 32 monolayers GaAs, indicating a long range electronic coupling.

Generating single photons at gigahertz modulation-speed using electrically controlled quantum dot microlenses

We report on the generation of single-photon pulse trains at a repetition rate of up to 1 GHz. We achieve this speed by modulating the external voltage applied on an electrically contacted quantum dot microlens, which is optically excited by a continuous-wave laser. By modulating the photoluminescence of the quantum dot microlens using a square-wave voltage, single-photon emission is triggered with a response time as short as (281 ± 19) ps, being 6 times faster than the radiative lifetime of (1.75 ± 0.02) ns. This large reduction in the characteristic emission time is enabled by a rapid capacitive gating of emission from the quantum dot, which is placed in the intrinsic region of a p-i-n-junction biased below the onset of electroluminescence. Here, since our circuit acts as a rectifying differentiator, the rising edge of the applied voltage pulses triggers the emission of single photons from the optically excited quantum dot. The non-classical nature of the photon pulse train generated at GHz-speed is pro...

Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.