Manuel Gschrey

Highly indistinguishable photons from deterministic quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography

The success of advanced quantum communication relies crucially on non-classical light sources emitting single indistinguishable photons at high flux rates and purity. We report on deterministically fabricated microlenses with single quantum dots inside which fulfil these requirements in a flexible and robust quantum device approach. In our concept we combine cathodoluminescence spectroscopy with advanced in situ three-dimensional electron-beam lithography at cryogenic temperatures to pattern monolithic microlenses precisely aligned to pre-selected single quantum dots above a distributed Bragg reflector. We demonstrate that the resulting deterministic quantum-dot microlenses enhance the photon-extraction efficiency to (23±3)%. Furthermore we prove that such microlenses assure close to pure emission of triggered single photons with a high degree of photon indistinguishability up to (80±7)% at saturation. As a unique feature, both single-photon purity and photon indistinguishability are preserved at high excitation power and pulsed excitation, even above saturation of the quantum emitter.The prospect of realizing building blocks for long-distance quantum communication is a major driving force for the development of advanced nanophotonic devices. Significant progress has been achieved in this field with respect to the fabrication of efficient quantum-dot-based single-photon sources. More recently, even spin-photon entanglement and quantum teleportation have been demonstrated in semiconductor systems. These results are considered as crucial steps towards the realization of a quantum repeater. The related work has almost exclusively been performed on self-assembled quantum dots (QDs) and random device technology. At this point it is clear that further progress in this field towards real applications will rely crucially on deterministic device technologies which will, for instance, enable the processing of bright quantum light sources with pre-defined emission energy. Here we report on enhanced photon-extraction efficiency from monolithically integrated microlenses which are coupled deterministically to single QDs. The microlenses with diameters down to 800 nm were aligned to single QDs by in-situ electron-beam lithography using a low-temperature cathodoluminescence setup. This deterministic device technology allowed us to obtain an enhancement of photon extraction efficiency for QDs integrated into microlenses as compared to QDs in unstructured surfaces. The excellent optical quality of the structures is demonstrated by cathodoluminescence and micro-photoluminescence spectroscopy. A Hong-Ou-Mandel experiment states the emission of single indistinguishable photons.

In situ electron-beam lithography of deterministic single-quantum-dot mesa-structures using low-temperature cathodoluminescence spectroscopy

We report on the deterministic fabrication of sub-μm mesa-structures containing single quantum dots (QDs) by in situ electron-beam lithography. The fabrication method is based on a two-step lithography process: After detecting the position and spectral features of single InGaAs QDs by cathodoluminescence (CL) spectroscopy, circular sub-μm mesa-structures are defined by high-resolution electron-beam lithography and subsequent etching. Micro-photoluminescence spectroscopy demonstrates the high optical quality of the single-QD mesa-structures with emission linewidths below 15 μeV and g(2)(0) = 0.04. Our lithography method has an alignment precision better than 100 nm which paves the way for a fully deterministic device technology using in situ CL lithography.

Single-photon emission at a rate of 143 MHz from a deterministic quantum-dot microlens triggered by a mode-locked vertical-external-cavity surface-emitting laser

We report on the realization of a quantum dot (QD) based single-photon source with a record-high single-photon emission rate. The quantum light source consists of an InGaAs QD which is deterministically integrated within a monolithic microlens with a distributed Bragg reflector as back-side mirror, which is triggered using the frequency-doubled emission of a mode-locked vertical-external-cavity surface-emitting laser (ML-VECSEL). The utilized compact and stable laser system allows us to excite the single-QD microlens at a wavelength of 508 nm with a pulse repetition rate close to 500 MHz at a pulse width of 4.2 ps. Probing the photon statistics of the emission from a single QD state at saturation, we demonstrate single-photon emission of the QD-microlens chip with g(2)(0) < 0.03 at a record-high single-photon flux of (143 ± 16) MHz collected by the first lens of the detection system. Our approach is fully compatible with resonant excitation schemes using wavelength tunable ML-VECSELs, which will optimize ...

Resolution and alignment accuracy of low-temperature in situ electron beam lithography for nanophotonic device fabrication

The performance of a deterministic lithographic technology to produce a reliable and accurate fabrication of nanophotonic devices based on epitaxial quantum dots is analyzed. Directly after the selection of qualified quantum dots by low-temperature cathodoluminescence spectroscopy in a scanning electron microscope, the in situ electron beam lithography step is performed. In an optimized process flow, quantum dot positions are identified with an accuracy of 25 nm, and a nanoscale alignment accuracy of the device structures of 24 nm for the emitters and one as low as 65 nm for feature sizes is demonstrated. Such accuracies surpass the performance of previously developed optical in situ lithography techniques, making this site control of quantum dots appropriate deterministic quantum device fabrication.

Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.

Operating single quantum emitters with a compact Stirling cryocooler

The development of an easy-to-operate light source emitting single photons has become a major driving force in the emerging field of quantum information technology. Here, we report on the application of a compact and user-friendly Stirling cryocooler in the field of nanophotonics. The Stirling cryocooler is used to operate a single quantum emitter constituted of a semiconductor quantum dot (QD) at a base temperature below 30 K. Proper vibration decoupling of the cryocooler and its surrounding enables free-space micro-photoluminescence spectroscopy to identify and analyze different charge-carrier states within a single quantum dot. As an exemplary application in quantum optics, we perform a Hanbury-Brown and Twiss experiment demonstrating a strong suppression of multi-photon emission events with g((2))(0) < 0.04 from this Stirling-cooled single quantum emitter under continuous wave excitation. Comparative experiments performed on the same quantum dot in a liquid helium (LHe)-flow cryostat show almost identical values of g((2))(0) for both configurations at a given temperature. The results of this proof of principle experiment demonstrate that low-vibration Stirling cryocoolers that have so far been considered exotic to the field of nanophotonics are an attractive alternative to expensive closed-cycle cryostats or LHe-flow cryostats, which could pave the way for the development of high-quality table-top non-classical light sources.

Observation of resonance fluorescence and the Mollow triplet from a coherently driven site-controlled quantum dot

Resonant excitation of solid state quantum emitters has the potential to deterministically excite a localized exciton while ensuring maximally coherent emission. In this work, we demonstrate the coherent coupling of an exciton localized in a lithographically positioned, site-controlled semiconductor quantum dot to an external resonant laser field. For strong continuous-wave driving we observe the characteristic Mollow triplet and analyze the Rabi splitting and sideband widths as a function of driving strength and temperature. The sideband widths increase linearly with temperature and the square of the driving strength, which we explain via coupling of the exciton to longitudinal acoustic phonons. We also find an increase of the Rabi splitting with temperature, which indicates a temperature-induced delocalization of the excitonic wave function resulting in an increase of the oscillator strength. Finally, we demonstrate coherent control of the exciton excited state population via pulsed resonant excitation and observe a damping of the Rabi oscillations with increasing pulse area, which is consistent with our exciton–photon coupling model. We believe that our work outlines the possibility to implement fully scalable platforms of solid state quantum emitters. Such scalability is one of the key prerequisites for more advanced, integrated nanophotonic quantum circuits.

A bright triggered twin-photon source in the solid state

The realization of integrated light sources capable of emitting non-classical multi-photon states, is a fascinating, yet equally challenging task at the heart of quantum optics [1]. One example of such light-states are photon twins, which up till now have mostly been generated with low emission rates using probabilistic parametric down-conversion sources [2] or atoms [3].

Study of high-resolution electron-beam resists for applications in low-temperature lithography

The authors report on the application of PMMA, hydrogen silsesquioxane, and AZ nLOF 2070 for electron-beam lithography at temperatures ranging from room temperature down to 6 K. Here, the low temperature range is of particular interest with respect to deterministic quantum-device processing using in-situ cathodoluminescence lithography. With decreasing temperature all resist under investigation show a decrease in sensitivity. In addition, an anomaly is observed for positive-tone PMMA for which the sensitivity rises for temperatures below 30 K. This behavior is explained in terms of a modified chain-scission mechanism that takes into account the sublimation of CO. Furthermore, our studies reveal evidence for a strong influence of the formation of volatile reaction products on PMMA. Alongside swelling of the negative-tone PMMA, an overall increased etch resistance as compared to unexposed PMMA and a decrease in sensitivity of almost one order of magnitude could be observed. This leads us to the assumption t...

Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography.

We report on a 3D electron beam lithography (EBL) technique using polymethyl methacrylate (PMMA) in the negative-tone regime as a resist. First, we briefly demonstrate 3D EBL at room temperature. Then we concentrate on cryogenic temperatures where PMMA exhibits a low contrast, which allows for straightforward patterning of 3D nano- and microstructures. However, conventional EBL patterning at cryogenic temperatures is found to cause severe damage to the microstructures. Through an extensive study of lithography parameters, exposure techniques, and processing steps we deduce a hypothesis for the cryogenic PMMAs structural evolution under electron beam irradiation that explains the damage. In accordance with this hypothesis, a two step lithography technique involving a wide-area pre-exposure dose slightly smaller than the onset dose is applied. It enables us to demonstrate a >95% process yield for the low-temperature fabrication of 3D microstructures.