Jason Thomas Bloking
Applied Materials
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Publication
Featured researches published by Jason Thomas Bloking.
international symposium on semiconductor manufacturing | 2007
Anchuan Wang; Jason Thomas Bloking; Linlin Wang; Manoj Vellaikal; Jin Ho Jeon; Young S. Lee; Harry S Whitesell
A novel gap fill approach, Integrated Profile Modulation (IPM), with repeating deposition and etch cycles is developed to extend HDP for complete gap fill to 45 nm node and beyond, with established HDP CVD film properties and integration. In this paper, the key aspects of the IPM process, deposition, etch, in-film fluorine and aluminum control are discussed to provide better understanding on gap fill optimization and manufacturing capability.
Archive | 2007
Zhong Qiang Hua; Rionard Purnawan; Jason Thomas Bloking; Anchuan Wang; Young S. Lee; Ellie Yieh
Archive | 2004
Xiaolin Chen; Jason Thomas Bloking
Archive | 2006
Srinivas D. Nemani; Young S. Lee; Ellie Yieh; Anchuan Wang; Jason Thomas Bloking; Lung-Tien Han
Archive | 2004
Siqing Lu; Canfeng Lai; Qiwei Liang; Maolin Long; Irene Chou; Jason Thomas Bloking; Steven H. Kim; Ellie Yieh
Archive | 2008
Anchuan Wang; Young S. Lee; Manoj Vellaikal; Jason Thomas Bloking; Jin Ho Jeon; Hemant P. Mungekar
Archive | 2005
Siqing Lu; Qiwei Liang; Canfeng Lai; Jason Thomas Bloking; Ellie Yieh
Archive | 2005
Siqing Lu; Qiwei Liang; Canfeng Lai; Robert T. Chen; Jason Thomas Bloking; Irene Chou; Steven H. Kim; Young S. Lee; Ellie Yieh
Archive | 2008
Anchuan Wang; Young S. Lee; Manoj Vellaikal; Jason Thomas Bloking; Jin Ho Jeon; Hemant P. Mungekar
Archive | 2008
Anchuan Wang; Young S. Lee; Manoj Vellaikal; Jason Thomas Bloking; Jin Ho Jeon; Hemant P. Mungekar
