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Dive into the research topics where Jean-Marc Hueber is active.

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Featured researches published by Jean-Marc Hueber.


Proceedings of SPIE, the International Society for Optical Engineering | 1999

Revisiting F2 laser for DUV microlithography

Thomas Hofmann; Jean-Marc Hueber; Palash P. Das; Scott Scholler

A molecular fluorine laser, specifically tailored for photolithography needs, was developed. Single line operation at 157.6nm was achieved by means of a prism assembly. Laser operation at repetition rates up to 1 kHz without signs of power saturation results in an average power of 15W. The energy stability was equal to comparable ArF laser. Proper choice of materials and corona pre-ionization enabled gas lifetimes in line with current ArF laser technology, without any need for cryogenic purification.


Proceedings of SPIE, the International Society for Optical Engineering | 2000

Performance of very high repetition rate ArF lasers

Jean-Marc Hueber; Herve A. Besaucele; Palash P. Das; Rick Eis; Alexander I. Ershov; Vladimir B. Fleurov; Dmitri V. Gaidarenko; Thomas Hofmann; Paul C. Melcher; William N. Partlo; Bernard K. Nikolaus; Scot T. Smith; Kyle R. Webb

We report the performance of a very high repetition rate ArF laser optimized for next generation, high NA, high throughput scanner. The lasers repetition rate exceeds 4kHz, at 5mJ, and at bandwidths of less than 1.2 pm. We discuss the complexity of high power operation, and make some estimates about the robustness of this technology. In particular, we discuss the risks of scaling to this high repetition rate, and prospects of exceeding 4kHz to near 6kHz with 95 percent bandwidths of less than 1pm.


Archive | 2001

Gas discharge laser with blade-dielectric electrode

Richard C. Ujazdowski; Michael C. Cates; Richard G. Morton; Jean-Marc Hueber; Ross H. Winnick


Archive | 2001

Electric discharge laser with acoustic chirp correction

William N. Partlo; Igor V. Fomenkov; Jean-Marc Hueber; Zsolt Bor; Eckehard D. Onkels; Michael C. Cates; Richard C. Ujazdowski; Vladimir B. Fleurov; Dmitri V. Gaidarenko


Archive | 2001

Gas discharge laser long life electrodes

Vladimir B. Fleurov; Michael C. Cates; Michael Du'lyea; Igor V. Fomenkov; Dmitri V. Gaidarenko; Jean-Marc Hueber; Richard G. Morton; Eckehard D. Onkels; Robert A. Shannon; Ross H. Winnick


Archive | 2000

Extreme repetition rate gas discharge laser

I. Roger Oliver; William N. Partlo; Richard M. Ness; Richard L. Sandstrom; Stuart L. Anderson; Alex P. Ivaschenko; James K. Howey; Vladimir Kulgeyko; Jean-Marc Hueber; Daniel L. Birx


Archive | 1999

ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE

Herve A. Besaucele; Jean-Marc Hueber; Alexander I. Ershov; Thomas Hofmann; Vladimir B. Fleurov


Archive | 2000

Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects

Richard G. Morton; Jean-Marc Hueber


Archive | 2007

ELECTRIC DISCHARGE LASER CAPABLE OF CORRECTING ACOUSTIC CHIRP

Zsolt Bor; Michael C. Cates; Vladimir B. Fleurov; Igor V. Fomenkov; Dmitri V. Gaidarenko; Jean-Marc Hueber; Eckehard D. Onkels; William N. Partlo; Richard C. Ujazdowski; ヴィ フォーメンコフ アイゴー; エヌ パートロ ウィリアム; ビー フルーロフ ウラディミール; ディ オンクルズ エクハード; マーク フーバー ジーン; ボル ズソルト; ヴィ ガイダレンコ ディミトリ; シー ケイツ マイケル; シー ユージャズドースキィ リチャード


Archive | 2007

Gas discharge laser system

Thomas Hofmann; Jean-Marc Hueber; Palach P. Das; Toshihiko Ishihara; Thomas P. Duffey; John T. Melchior; Herve A. Besaucele; Richard G. Morton; Richard M. Ness; Peter C. Newman; William N. Partlo; Daniel A. Rothweil; Richard L. Sandstrom

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