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Jiro Ohshima

Toshiba

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Publication

Featured researches published by Jiro Ohshima.

Archive | 1984

Method of forming through holes by differential etching of stacked silicon oxynitride layers

Toshiyo Ito; Jiro Ohshima

Archive | 1990

Method of manufacturing super self-alignment technology bipolar transistor

Shin-ichi Taka; Jiro Ohshima

Archive | 1988

Method of manufacturing bipolar transistor with self-aligned external base and emitter regions

Shin-ichi Taka; Jiro Ohshima

Archive | 1990

Method of manufacturing a semiconductor device having a silicide layer

Jiro Ohshima; Shin-ichi Taka; Toshiyo Motozima; Hiroshi Naruse

Archive | 1986

Method of manufacturing a semiconductor device with conductive trench sidewalls

Shin-ichi Taka; Jiro Ohshima; Masahiro Abe; Masaharu Aoyama

Archive | 1987

Semiconductor device having insulating layer including polyimide film

Masahiro Abe; Masaharu Aoyama; Jiro Ohshima; Takashi Ajima

Archive | 1989

Method of manufacturing semiconductor integrated circuit device having transistor

Shin-ichi Taka; Jiro Ohshima

Archive | 1987

Method for manufacturing high-breakdown voltage semiconductor device

Yutaka Koshino; Yoshiro Baba; Jiro Ohshima

Archive | 1983

Method of manufacturing a semiconductor device using epitaxially regrown protrusion as an alignment marker

Yutaka Koshino; Jiro Ohshima; Takashi Ajima; Toshio Yonezawa

Archive | 1983

Wiring material for semiconductor device and method for forming wiring pattern therewith

Jiro Ohshima; Masahiro Abe; Yutaka Koshino

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Yutaka Koshino

Toshiba

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Takashi Ajima

Toshiba

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Shin-ichi Taka

Toshiba

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Masahiro Abe

Toshiba

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Toshio Yonezawa

Toshiba

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Masaharu Aoyama

Toshiba

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Toshiyo Motozima

Toshiba

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Hiroshi Naruse

Toshiba

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Yoshiro Baba

Toshiba

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