Jiro Ohshima

Method of forming through holes by differential etching of stacked silicon oxynitride layers

Method of manufacturing super self-alignment technology bipolar transistor

Method of manufacturing bipolar transistor with self-aligned external base and emitter regions

Method of manufacturing a semiconductor device having a silicide layer

Method of manufacturing a semiconductor device with conductive trench sidewalls

Semiconductor device having insulating layer including polyimide film

Method of manufacturing semiconductor integrated circuit device having transistor

Method for manufacturing high-breakdown voltage semiconductor device

Method of manufacturing a semiconductor device using epitaxially regrown protrusion as an alignment marker

Wiring material for semiconductor device and method for forming wiring pattern therewith