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Dive into the research topics where Johann Trenkler is active.

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Featured researches published by Johann Trenkler.


Physical Review B | 2010

Depth-dependent ordering, two-length-scale phenomena, and crossover behavior in a crystal featuring a skin layer with defects

Charo I. Del Genio; Kevin E. Bassler; Aleksandr L. Korzhenevskii; Rozaliya Barabash; Johann Trenkler; George Reiter; S. C. Moss

Structural defects in a crystal are responsible for the “two-length-scale” behavior in which a sharp central peak is superimposed over a broad peak in critical diffuse x-ray scattering. We have previously measured the scaling behavior of the central peak by scattering from a near-surface region of a V2H crystal, which has a first-order transition in the bulk. As the temperature is lowered toward the critical temperature, a crossover in critical behavior is seen, with the temperature range nearest to the critical point being characterized by mean-field exponents. Near the transition, a small two-phase coexistence region is observed. The values of transition and crossover temperatures decay with depth. An explanation of these experimental results is here proposed by means of a theory in which edge dislocations in the near-surface region occur in walls oriented in the two directions normal to the surface. The strain caused by the dislocation lines causes the ordering in the crystal to occur as growth of roughly cylindrically shaped regions. After the regions have reached a certain size, the crossover in the critical behavior occurs, and mean-field behavior prevails. At a still lower temperature, the rest of the material between the cylindrical regions orders via a weak first-order transition.


Archive | 2003

Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system

Levinus Pieter Bakker; Ralph Kurt; Bastiaan Matthias Mertens; Markus Weiss; Johann Trenkler; Wolfgang Singer


Archive | 2003

Protective coating system for reflective optical elements, reflective optical element and method for the production thereof

Johann Trenkler


Archive | 2013

Reflective optical element and EUV lithography appliance

Johann Trenkler; Hans-Juergen Mann; Udo Nothelfer


Archive | 2010

Projection objective and method for its manufacture

Hans-Juergen Mann; Stephan Muellender; Johann Trenkler; Hartmut Enkisch


Archive | 2010

Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate

Ulrich Loering; Gerd Reisinger; Franz-Josef Stickel; Sonja Schneider; Johann Trenkler; Stefan Kraus; Gordon Doering; Aksel Goehnermeier


Archive | 2004

Schutzsystem für reflektive optische Elemente, reflektives optisches Element und Verfahren zu deren Herstellung

Johann Trenkler


Archive | 2009

OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT

Marco Wedowski; Markus Weiss; Stephan Müllender; Johann Trenkler; Hartmut Enkisch; Gisela Sipos; H.A. van Mierlo; Michiel David Nijkerk; Fokko Pieter Wieringa; Nadyeh Shariloo


Archive | 2004

Method for fabricating multi-layers e.g. for EUV-lithography, involves tempering of multi-layers after mounting uppermost layer

Hartmut Enkisch; Johann Trenkler


Archive | 2004

Reflektives optisches Element und EUV-Lithographiegerät

Johann Trenkler; Hans-Juergen Mann; Udo Nothelfer

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