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Dive into the research topics where Franz-Josef Stickel is active.

Publication


Featured researches published by Franz-Josef Stickel.


International Symposium on Optical Science and Technology | 2000

Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Udo Dinger; Frank Eisert; Holger Lasser; Maximilian Mayer; A. Seifert; Guenther Seitz; Siegfried Stacklies; Franz-Josef Stickel; Martin Weiser

In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.


Archive | 2013

EUV Exposure Apparatus

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot


Archive | 2009

Spiegel zur Verwendung in einer Mikrolithographie-Projektionsbelichtungsanlage

Hartmut Enkisch; Hans-Jürgen Mann; Sascha Migura; Oliver Natt; Martin Rocktäschel; Franz-Josef Stickel


Archive | 2010

Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate

Ulrich Loering; Gerd Reisinger; Franz-Josef Stickel; Sonja Schneider; Johann Trenkler; Stefan Kraus; Gordon Doering; Aksel Goehnermeier


Archive | 2012

Mirror for use in a microlithography projection exposure apparatus

Martin Rocktaeschel; Hartmut Enkisch; Franz-Josef Stickel; Oliver Natt; Hans-Juergen Mann; Sascha Migura


Archive | 2003

Objective with at least one aspheric lens

Karl-Heinz Schuster; Frank Schillke; Franz-Josef Stickel; Alexander Epple


Archive | 2006

Method of manufacturing a projection-optical system

Alexander Epple; Franz-Josef Stickel


Archive | 2004

Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type

Hans-Juergen Rostalski; Alexander Epple; Aurelian Dodoc; Johannes Wangler; Karl-Heinz Schuster; Joerg Schultz; Franz-Josef Stickel; Wolfgang Singer; Joachim Wietzorrek


Archive | 2009

Vorrichtung und verfahren zur bearbeitung von optischen elementen mittels laserablation

Rolf Freimann; Franz-Josef Stickel; Klaus Zimmer; R. Böhme


Archive | 2016

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot

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