John Golz

An 800-MHz embedded DRAM with a concurrent refresh mode

An 800-MHz embedded DRAM macro employs a memory cell utilizing a device from the 90-nm high-performance technology menu; a 2.2-nm gate oxide 1.5 V IO device. A concurrent refresh mode is designed to improve the memory utilization to over 99% for a 64 /spl mu/s data retention time. A concurrent refresh scheduler utilizes up-count and down-count registers to identify at least one array to be refreshed at every clock cycle, emulating a classical distributed refresh mode. A command multiplier employs low frequency phased clock signals to generate the clock, commands, and addresses at rates up to 4/spl times/ that of the tester frequency. The macro integrates masked redundancy allocation logic during at speed multibank test. The hardware results show a 312-MHz random access frequency and 800-MHz multibank frequency at 1.2 V, respectively.

A 500MHz Random Cycle 1.5ns-Latency, SOI Embedded DRAM Macro Featuring a 3T Micro Sense Amplifier

A prototype SOI embedded DRAM macro is developed for high-performance microprocessors and introduces performance-enhancing 3T micro sense amplifier architecture (muSA). The macro was characterized via a test chip fabricated in a 65nm SOI deep-trench DRAM process. Measurements confirm 1.5ns random access time with a 1V supply at 85deg and low voltage operation with a 600mV supply.

A 1 MB Cache Subsystem Prototype With 1.8 ns Embedded DRAMs in 45 nm SOI CMOS

We describe a single voltage supply, 1 MB cache subsystem prototype that integrates 2 GHz embedded DRAM (eDRAM) macros with on-chip word-line voltage supply generation , a 4 Kb one-time-programmable read-only memory (OTPROM) for redundancy and repair control, on-chip OTPROM programming voltage generation, clock generation and distribution, array built-in self-test circuitry (ABIST), user logic and pervasive logic. The eDRAM employs a programmable pipeline, achieving 1.8 ns latency, and features concurrent refresh capability.

Three-dimensional wafer stacking using Cu TSV integrated with 45nm high performance SOI-CMOS embedded DRAM technology

For high-volume production of 3D-stacked chips with through-silicon-via (TSVs), wafer-scale bonding offers lower production cost compared with bump bond technology [1][2][3] and is promising for interconnect pitch <;= 5μ range using available tooling. Prior work [3] has presented wafer-scale integration with tungsten TSV for low-power applications. This paper reports the first use of low-temperature oxide bonding and copper TSV to stack high performance cache cores manufactured in 45nm SOI-CMOS embedded DRAM (EDRAM) having 12 to 13 copper wiring levels per strata. A key feature of this process is its compatibility with the existing high performance POWER7™ EDRAM core [4] requiring neither re-design nor modification of the existing CMOS fabrication process. Hardware measurements show no significant impact on device drive and off-current. Functional test at wafer level confirms 1.48GHz 3D stacked EDRAM operation.

Prototype of multi-stacked memory wafers using low-temperature oxide bonding and ultra-fine-dimension copper through-silicon via interconnects

Reported for the first time is proof-of-concept multi-stacking of memory wafers based on low-temperature oxide wafer bonding using novel design and integration of two types of ultra-fine-dimension copper TSV interconnects. The combined via-middle (intra-via) and via-last (inter-via) strategy allows for the greatest degree of interconnectivity with the tightest allowable pitches and permits a highly integrated interconnect system across the stack. In combination with the successful metallization of the ultra-fine-dimension TSVs, the present work has shown the viability to extend the perceived TSV technology beyond the ITRS roadmap.

A one MB cache subsystem prototype with 2GHz embedded DRAMs in 45nm SOI CMOS

We present a 1 MB cache subsystem that integrates 2 GHz embedded DRAM macros, charge pump circuits, a 4 Kb one-time-programmable ROM, clock multipliers, and built-in self test circuitry, having a 36.5 GB/s peak system data-rate. The eDRAM employs a programmable pipeline, achieving a 1.8 ns latency.