John E. Barth

A 50-ns 16-Mb DRAM with a 10-ns data rate and on-chip ECC

A high-speed 16-Mb DRAM chip with on-chip error-correcting code (ECC), which supports either 11/11 or 12/0 RAS/CAS addressing and operates on a 3.3- or 5-V power supply, is described. It can be packaged as a 2-Mb*8, 4-Mb*4, 8-Mb*2, or 16-Mb*1 DRAM, And is capable of operating in fast page mode, static column mode, or toggle mode. Speed and flexibility are achieved by a pipeline layout and on-chip SRAMs that buffer entire ECC words. The use of redundant word and bit lines in conjunction with the ECC produces a synergistic fault-tolerance effect. >

Processor-based built-in self-test for embedded DRAM

A built-in self-test engine and test methodology have been developed for testing a family of high-bandwidth, high-density DRAM macros. The DRAM macros range in size from 256/spl times/16/spl times/128 to 2 K/spl times/16/spl times/256 (Word/spl times/Bit/spl times/Data) and are targeted for embedded applications in application-specific integrated circuit designs. The processor-based test engine, with two separate instruction storage memories, combines with flexible address, data, and clock generators to provide DRAM high-performance ac testing using a minimum of dedicated test pins. Test results are compressed through on-macro, two-dimensional, redundancy allocation logic to provide direct programming information for the fuser via a serial scan port. The design is intended for reuse on future DRAM-generation subarrays and can be adapted to any number of address or data-pin configurations.

A 500MHz Random Cycle 1.5ns-Latency, SOI Embedded DRAM Macro Featuring a 3T Micro Sense Amplifier

A prototype SOI embedded DRAM macro is developed for high-performance microprocessors and introduces performance-enhancing 3T micro sense amplifier architecture (muSA). The macro was characterized via a test chip fabricated in a 65nm SOI deep-trench DRAM process. Measurements confirm 1.5ns random access time with a 1V supply at 85deg and low voltage operation with a 600mV supply.

A 45 nm SOI Embedded DRAM Macro for the POWER™ Processor 32 MByte On-Chip L3 Cache

A 1.35 ns random access and 1.7 ns-random-cycle SOI embedded-DRAM macro has been developed for the POWER7™ high-performance microprocessor. The macro employs a 6 transistor micro sense-amplifier architecture with extended precharge scheme to enhance the sensing margin for product quality. The detailed study shows a 67% bit-line power reduction with only 1.7% area overhead, while improving a read zero margin by more than 500ps. The array voltage window is improved by the programmable BL voltage generator, allowing the embedded DRAM to operate reliably without constraining of the microprocessor voltage supply windows. The 2.5nm gate oxide transistor cell with deep-trench capacitor is accessed by the 1.7 V wordline high voltage (VPP) with V WL low voltage (VWL), and both are generated internally within the microprocessor. This results in a 32 MB on-chip L3 on-chip-cache for 8 cores in a 567 mm POWER7™ die.

An ASIC library granular DRAM macro with built-in self test

System-on-a-chip architectures are generating increased interest as the level of integration is expanded by the arrival of 0.25 /spl mu/m processes. Many merged DRAM and logic applications use custom logic circuits that either surround or are embedded in a DRAM core. A more classic ASIC library approach where a DRAM macro family is used as a logic building block with the software tools associated with ASIC logic macros: i.e., timing analysis, place-and-route, logic simulation, and test generation. The macro operation is generic, yet versatile, allowing gate-array or standard-cell interface personalization. The design has a wide databit interface of 128 or 256 bits, separate databit-in and databit-out to ease bus contention, bit-write capability for multiplexing to narrower databit widths or partial databit-writes, and granular-density options from 0.5 Mb-8 Mb. Built-in self test (BIST) with two-dimensional redundancy calculation and allocation, along with in-situ burn-in capability, is also included. The DRAM macro design is architectured for reuse on future DRAM-generation sub-arrays and is adaptable to any number of address or databit-pin configurations. Its methodology and functionality have been verified in a 0.45 /spl mu/m trench DRAM technology.

A 300 MHz multi-banked eDRAM macro featuring GND sense, bit-line twisting and direct reference cell write

A 0.12 /spl mu/m growable eDRAM macro has GND sense, bit-line twisting, direct reference cell write, a flexible multi-banking protocol, and column redundancy to support multi-banking. The protocol supports simultaneous activate, read/write and pre-charge to three different banks. Hardware measurements verify 300 MHz operation, 6.6 ns tacc, and 10 ns trc.

A 1 MB Cache Subsystem Prototype With 1.8 ns Embedded DRAMs in 45 nm SOI CMOS

We describe a single voltage supply, 1 MB cache subsystem prototype that integrates 2 GHz embedded DRAM (eDRAM) macros with on-chip word-line voltage supply generation , a 4 Kb one-time-programmable read-only memory (OTPROM) for redundancy and repair control, on-chip OTPROM programming voltage generation, clock generation and distribution, array built-in self-test circuitry (ABIST), user logic and pervasive logic. The eDRAM employs a programmable pipeline, achieving 1.8 ns latency, and features concurrent refresh capability.

A 500-MHz multi-banked compilable DRAM macro with direct write and programmable pipelining

This work describes a 500-MHz compiled eDRAM macro offered in a 90-nm logic-based process. The macro architecture is optimized for high bandwidth while enabling compilation in bank and data-word dimensions. A direct write scheme simultaneously improves random bank cycle time and row access time without signal loss. The benefits of ground sensing, reference cells, and bitline twisting was reviewed. A variable stage pipeline extends the macro bandwidth while offering flexibility in clock frequencies. The redundancy system is modified to support direct write and piping. Finally, BIST was enhanced to utilize electrically blown fuses, enabling one-touch test and repair. Hardware results was presented.

Three-dimensional wafer stacking using Cu TSV integrated with 45nm high performance SOI-CMOS embedded DRAM technology

For high-volume production of 3D-stacked chips with through-silicon-via (TSVs), wafer-scale bonding offers lower production cost compared with bump bond technology [1][2][3] and is promising for interconnect pitch <;= 5μ range using available tooling. Prior work [3] has presented wafer-scale integration with tungsten TSV for low-power applications. This paper reports the first use of low-temperature oxide bonding and copper TSV to stack high performance cache cores manufactured in 45nm SOI-CMOS embedded DRAM (EDRAM) having 12 to 13 copper wiring levels per strata. A key feature of this process is its compatibility with the existing high performance POWER7™ EDRAM core [4] requiring neither re-design nor modification of the existing CMOS fabrication process. Hardware measurements show no significant impact on device drive and off-current. Functional test at wafer level confirms 1.48GHz 3D stacked EDRAM operation.

A 45nm SOI embedded DRAM macro for POWER7TM 32MB on-chip L3 cache

Logic-based embedded DRAM has matured into a wide range of ASIC applications, SRAM replacements [1] and off-chip caches for microprocessors [2]. While embedded DRAM has been leveraged in supercomputers such as IBMs BlueGene/L [3], its use has been limited to moderate performance bulk logic technologies. Although prototypes have been demonstrated [4], DRAM has yet to be embedded on a high performance microprocessor. This paper discloses an SOI DRAM macro implemented on-chip with the IBM POWER7™ high performance microprocessor [5], and introduces enhancements to the micro sense amp (µSA) architecture [6]. This high performance DRAM macro is used to construct a large 32MB L3 cache on-chip, eliminating delay, area and power from the off-chip interface, simultaneously improving system performance, reducing cost, power and soft error vulnerability. Figure 19.1.1a shows an SEM of the 45nm SOI DRAM Device and Deep Trench (DT) capacitor [7]. DT offers 25x more capacitance than planar structures and was also utilized to reduce on-chip voltage island supply noise.