Joseph Jech
Eastman Kodak Company
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Publication
Featured researches published by Joseph Jech.
Advances in Resist Technology and Processing V | 1988
William C. McColgin; Robert C. Daly; Joseph Jech; Thomas B. Brust
A new silylated resist process has been developed that provides the advantages of trilayer photoresist processing in a simpler bilayer format. In this new process, silicon for oxygen plasma etch resistance is added to a conventional photoresist layer after it has been exposed and developed. This silylated resist image provides an etch mask for 02 RIE etching of an underlying organic planarizing layer with 15:1 selectivity, vertical profiles, and high resolution. The process is positive-working, uses conventional materials, and improves the thermal stability of the resist image.
Archive | 1989
William C. McColgin; Thomas B. Brust; Robert C. Daly; Joseph Jech; Robert D. Lindholm
Archive | 1993
Joseph Jech
Archive | 1995
Joseph F. Revelli; Jeffrey I. Hirsh; Joseph Jech; Douglas R. Robello; Stephen P. Barry; Alan C. G. Nutt
Archive | 1998
Joseph Jech; John Andrew Lebens; John C. Brazas
Archive | 2011
Yonglin Xie; Michael J. Piatt; Joseph Jech; Qing Yang
Archive | 1998
Jeffrey I. Hirsh; Joseph F. Revelli; Joseph Jech
Archive | 2008
Hrishikesh V. Panchawagh; Constantine N. Anagnostopoulos; Joseph E. Yokajty; Joseph Jech
Archive | 2009
Yonglin Xie; Joseph Jech; Michael J. Piatt
Archive | 2012
Yonglin Xie; Joseph Jech; Carolyn R. Ellinger
