Joseph P. Caulfield

Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process window

In-situ integrated oxide etch process particularly useful for copper dual damascene

Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window

Oxide etch process using hexafluorobutadiene and related unsaturated hydrofluorocarbons

Self aligned contact etch using difluoromethane and trifluoromethane

Highly selective process for etching oxide over nitride using hexafluorobutadiene

Integrated self aligned contact etch

Highly selective oxide etch process using hexafluorobutadiene

Enhancement of silicon oxide etch rate and substrate selectivity with xenon addition

Two-step integrated self aligned contact etch