Hongqing Shan
Applied Materials
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Publication
Featured researches published by Hongqing Shan.
Journal of Vacuum Science and Technology | 1998
Roger Alan Lindley; Claes Bjorkman; Hongqing Shan; Kuang-Han Ke; Kenny L. Doan; Richard R. Mett; Mike Welch
The effect of magnetic field on plasma uniformity was investigated for a capacitively coupled plasma in a dielectric etch chamber and a tool to measure the dc bias uniformity across the high-powered cathode (e.g., 1200 W) was developed. At that power, the dc bias can be as high as 1500 V at 50 mT. A 5% variation in the dc bias across the cathode corresponds to a 75 V potential drop across the wafer, which may in turn cause degradation or breakdown of gate oxide structures. Therefore control of the instantaneous plasma uniformity is important to minimize device damage. The primary effect of the magnetic field on instantaneous plasma uniformity is through the E×B drift force which, because of the strong electric field at the cathode surface at high powers, dominates the other magnetic field effects on the plasma. dc bias measurements show that the plasma nonuniformity can be optimized by adjusting the gradient of the magnetic field, and thus the E×B drift force, across the cathode over a wide range of magne...
Archive | 2001
Hongqing Shan; Claes Bjorkman; Paul E. Luscher; Richard R. Mett; Michael Welch
Archive | 2003
Kenny L. Doan; Yunsang Kim; Mahmoud Dahimene; Jingbao Liu; Bryan Pu; Hongqing Shan; Don E. Curry
Archive | 1999
Hoiman Hung; Joseph P. Caulfield; Hongqing Shan; Ruiping Wang; Gerald Zheyao Yin
Archive | 2003
Michael Barnes; John Holland; Hongqing Shan; Bryan Y. Pu; Mohit Jain; Zhifeng Sui; Michael D. Armacost; Neil E. Hanson; Diana Xiaobing Ma; Ashok K. Sinha; Dan Maydan
Archive | 2000
Yungsang Kim; Takehiko Komatsu; Claes Bjorkman; Hongqing Shan
Archive | 2002
Jingbao Liu; Takehiko Komatsu; Hongqing Shan; Keiji Horioka; Bryan Pu
Archive | 2001
James D. Carducci; Hamid Noorbakhsh; Evans Lee; Hongqing Shan; Siamak Salimian; Paul E. Luscher; Michael Welch
Archive | 2002
Yunsang Kim; Kenny L. Doan; Claes Bjorkman; Hongqing Shan
Archive | 2002
Hongqing Shan; Kenny L. Doan; Jingbao Liu; Michael Barnes; Huong Thanh Nguyen; Christopher Dennis Bencher; Christopher S. Ngai; Wendy H. Yeh; Eda Tuncel; Claes Bjorkman