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Juergen Hartmaier

Carl Zeiss AG

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Publication

Featured researches published by Juergen Hartmaier.

Archive | 2002

Microlithographic projection illumination system

Martin Brunotte; Juergen Hartmaier; Hubert Holderer; Winfried Kaiser; Alexander Kohl; Jens Kugler; Manfred Maul; Christian Wagner

Archive | 2002

DELAY ELEMENT MADE FROM A CUBIC CRYSTAL AND CORRESPONDING OPTICAL SYSTEM

Juergen Hartmaier; Damian Fiolka; Markus Zenzinger; Birgit Mecking; Olaf Dittmann; Toralf Gruner; Vladimir Kamenov; Martin Brunotte

Archive | 2004

Retardation element made from cubic crystal and an optical system therewith

Juergen Hartmaier; Damian Fiolka; Markus Zenzinger; Birgit Mecking; Olaf Dittmann; Toralf Gruner; Vladimir Kamenov; Martin Brunotte

Archive | 2003

Optical system for microlithography, has optical retarding system placed between two optical subsystems and includes optical retarding unit of one-half of wavelength between two mutually orthogonal states of polarization

Juergen Hartmaier; Anton Cersowsky; Nils Dieckmann

Archive | 2007

Optical system of an illumination device of a projection exposure apparatus

Karl-Heinz Schuster; Juergen Hartmaier; Manfred Maul; Dieter Schmerek; Detlev Mueller; Otto Hahnemann; Frank Marianek; Gundula Weiss; Damian Fiolka

Archive | 2007

Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen A lighting device for a microlithographic projection exposure apparatus with an optical element made of a uniaxial crystal with several parallel or perpendicular to the crystal axis arranged refractive or diffractive structures

Karl-Heinz Schuster; Juergen Hartmaier; Manfred Maul; Dieter Schmerek; Detlev Mueller; Otto Hahnemann; Frank Marianek; Gundula Weiss; Damian Fiolka

Archive | 2007

Lighting device for a microlithographic projection exposure apparatus having an optical element made of a uniaxial crystal with several parallel or arranged perpendicular to the crystal axis of refractive or diffractive structures

Karl-Heinz Schuster; Juergen Hartmaier; Manfred Maul; Dieter Schmerek; Detlev Mueller; Otto Hahnemann; Frank Marianek; Gundula Weiss; Damian Fiolka

Archive | 2002

Microlithograpic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method

Martin Brunotte; Juergen Hartmaier; Hubert Holderer; Winfried Kaiser; Alexander Kohl; Jens Kugler; Manfred Maul; Christian Wagner

Archive | 2002

Dispositif d'insolation par projection pour microlithographie, systeme optique, procede de fabrication d'un objectif de projection pour microlithographie et procede de structuration microlithographique

Martin Brunotte; Juergen Hartmaier; Hubert Holderer; Winfried Kaiser; Alexander Kohl; Jens Kugler; Manfred Maul; Christian Wagner

Archive | 2002

Projektionsbelichtungsanlage der mikrolithographie

Martin Brunotte; Juergen Hartmaier; Hubert Holderer; Winfried Kaiser; Alexander Kohl; Jens Kugler; Manfred Maul; Christian Wagner

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Manfred Maul

Carl Zeiss AG

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Martin Brunotte

Carl Zeiss AG

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Damian Fiolka

Carl Zeiss AG

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Alexander Kohl

Carl Zeiss AG

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Christian Wagner

Carl Zeiss AG

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Hubert Holderer

Carl Zeiss AG

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Jens Kugler

Carl Zeiss AG

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Winfried Kaiser

Carl Zeiss AG

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Birgit Mecking

Carl Zeiss AG

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Detlev Mueller

Carl Zeiss AG

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