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Featured researches published by Junji Hirase.


IEEE Transactions on Electron Devices | 1992

Deep-submicrometer large-angle-tilt implanted drain (LATID) technology

Takashi Hori; Junji Hirase; Yoshinori Odake; Takatoshi Yasui

Deep-submicrometer large-angle-tilt implanted drain (LATID) technology is described. It is found by Monte Carlo process simulation and SIMS measurements that a sufficiently long n/sup -/ region can be formed under the gate by taking advantage of large-angle-tilt implant and successfully without ion channeling by taking care of the implant direction. A design that offsets the n/sup +/ implant by sidewall spacers to suppress the n/sup +/-gate overlap to zero while keeping the n/sup -/ region fully overlapped with the gate is found to be crucial for improved performance and reliability. The device performance, such as current drivability and short-channel effects, is described, and the circuit speed is investigated. Hot-carrier effects such as lateral electric field and device lifetime over a wide range of drain structures are also investigated. The tradeoff between device performance and hot-carrier reliability in deep-submicrometer LATID FETs is discussed. >


international solid-state circuits conference | 1994

A 256-Mb DRAM with 100 MHz serial I/O ports for storage of moving pictures

Hisakazu Kotani; Hironori Akamatsu; Y. Naito; T. Fujii; T. Iwata; T. Tsuji; H. Asaka; Y. Itoh; N. Shimizu; Junji Hirase; Y. Shibata; K. Yamashita; T. Hori; Tsutomu Fujita

A 256-Mb DRAM with refresh-free-FIFO function for storage of moving pictures has been developed using 0.25-/spl mu/m CMOS technology. An operating current of 73 mA (reduction of 52% compared with a conventional circuit) has been achieved at 100 MHz based on introducing (1) a suppressed High(H)-level differential data transfer scheme which ran be operated at 0.6 V, (2) a new pre-charge method which features a 1/2 VCC precharge level in read cycle and VSS pre-charge level in write cycle, and (3) a divided operation of array circuits for serial access. >


international solid-state circuits conference | 2016

6.1 An over 120dB simultaneous-capture wide-dynamic-range 1.6e− ultra-low-reset-noise organic-photoconductive-film CMOS image sensor

Kazuko Nishimura; Yoshihiro Sato; Junji Hirase; Ryota Sakaida; Masaaki Yanagida; Tokuhiko Tamaki; Masayuki Takase; Hidenari Kanehara; Masashi Murakami; Yasunori Inoue

Image sensors are increasingly becoming key devices for various applications (in-vehicle, surveillance, medical, and so on). To realize the best possible imaging and sensing performance, there is growing demand for extended dynamic range that can precisely reproduce color tone. Several conventional papers have described methods for enhancing dynamic range, such as multiple exposures in a frame [1] and a lateral overflow integration capacitor [2,3]. However, all these techniques realize a 100-to-200dB dynamic range by synthesizing multiple exposures, with asynchronism between multiple exposures causing time distortion. Thus, a simultaneous-capture wide dynamic range (SCWDR) over 100dB is desired.


Archive | 1993

Insulated gate FET with a particular LDD structure

Junji Hirase; Takashi Hori


Archive | 1994

High speed mis-type intergrated circuit with self-regulated back bias

Junji Hirase; Hironori Akamatsu; Susumu Akamatsu; Takashi Hori


symposium on vlsi circuits | 2013

An ultra-low noise photoconductive film image sensor with a high-speed column feedback amplifier noise canceller

Motonori Ishii; Shigetaka Kasuga; Keisuke Yazawa; Yusuke Sakata; Toru Okino; Yoshihiro Sato; Junji Hirase; Yutaka Hirose; Tokuhiko Tamaki; Yoshiyuki Matsunaga; Yoshihisa Kato


Archive | 1995

Method of manufacturing a semiconductor device having a dummy cell

Junji Hirase; Shin Hashimoto


Archive | 2002

Temperature measuring method, heat treating method, and semiconductor device manufacturing method

Satoshi Shibata; Junji Hirase; Tatsuo Sugiyama; Emi Kanasaki; Fumitoshi Kawase; Yasushi Naito


Archive | 2002

Method for measuring temperature, annealing method and method for fabricating semiconductor device

Satoshi Shibata; Junji Hirase; Tatsuo Sugiyama; Emi Kanasaki; Fumitoshi Kawase; Yasushi Naito


Archive | 2014

SOLID STATE IMAGE-CAPTURE DEVICE AND PRODUCTION METHOD THEREFOR

Masayuki Takase; 雅之 高瀬; Yoshihiro Sato; 佐藤 好弘; Junji Hirase; 平瀬 順司; Tokuhiko Tamaki; 徳彦 玉置

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