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Dive into the research topics where Yoshiyuki Matsunaga is active.

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Featured researches published by Yoshiyuki Matsunaga.


IEEE Transactions on Electron Devices | 1991

A high-sensitivity MOS photo-transistor for area image sensor

Yoshiyuki Matsunaga; Hirofumi Yamashita; Sohei Manabe; Nozomu Harada

A new MOS phototransistor, called a double-gate floating surface phototransistor, has been fabricated and evaluated. In the phototransistor cell, the gate area has been divided into two parts, the accumulation section and the detection section, in order to realize a low input capacitance for a high optical gain. The device achieved a noise equivalent exposure of 2*10/sup -4/ lx at 16-ms integration time and a dynamic range of 75 dB with a new line potential modulation operation. >


international electron devices meeting | 1988

A new high sensitivity photo-transistor for area image sensors

Hirofumi Yamashita; Yoshiyuki Matsunaga; Mamoru Iesaka; Sohei Manabe; Nozomu Harada

A novel MOS phototransistor with a high optical gain, called a double-gate floating-surface phototransistor, has been proposed and fabricated. The phototransistor realizes a 0.8-electron RMS noise equivalent signal over a 3.58-MHz-wide band. It achieves a dynamic range of 75 dB with an amplification characteristic suitable for TV-camera application. It is concluded that an ultra-high-sensitivity image sensor can be realized with this device.<<ETX>>


IEEE Journal of Solid-state Circuits | 1991

A highly sensitive on-chip charge detector for CCD area image sensor

Yoshiyuki Matsunaga; Hirofumi Yamashita; Shinji Ohsawa

A novel on-chip charge detector for charge-coupled-device (CCD) image sensor applications was fabricated and evaluated. The device, called the double-gate floating surface detector, achieves a charge/voltage conversion gain of 220 mu V/electron, a noise equivalent electron of 0.5 electrons r.m.s. and a dynamic range of 79 dB over 3.58-MHz video bandwidth at room temperature. In the small-signal region under 20 electrons, which is the photon counting region for highly sensitive imaging devices, the device was evaluated by observing the discrete voltage levels corresponding to the number of signal electrons on an oscilloscope. This evaluation confirmed that the high charge voltage conversion gain is also maintained in this region. >


international solid-state circuits conference | 1994

A 2/3-inch 2M-pixel STACK-CCD imager

Hirofumi Yamashita; Michio Sasaki; Shinji Ohsawa; Ryohei Miyagawa; E. Ohba; Nobuo Nakamura; N. Endoh; Ikuko Inoue; Yoshiyuki Matsunaga; Yoshitaka Egawa; Yukio Endo; Tetsuya Yamaguchi; Yoshinori Iida; Akihiko Furukawa; Sohei Manabe; Y. Ishizuka; H. Ichinose; T. Niiyama; Hisanori Ihara; Hidetoshi Nozaki; I. Yanase; Naoshi Sakuma; Takeo Sakakubo; Hiroto Honda; F. Masuoka; S.-I. Sano

Shrinking pixel size in conventional CCD imagers degrades device performance. Unsatisfactory smear noise of -90 dB is attained in a 2/3-inch 2M pixel CCD imager. The STACK-CCD imager has a great advantage regarding this problem. A 100% aperture ratio and low smear noise are maintained regardless of future pixel shrinking, because CCD scanning circuits are overlaid with an amorphous silicon (a-Si) photoconversion layer.<<ETX>>


IEEE Journal of Solid-state Circuits | 1995

A 2/3-in 2 million pixel STACK-CCD HDTV imager

Hirofumi Yamashita; N. Sasaki; Shinji Ohsawa; Ryohei Miyagawa; E. Ohba; Keiji Mabuchi; Nobuo Nakamura; Nagataka Tanaka; N. Endoh; Ikuko Inoue; Yoshiyuki Matsunaga; Yoshitaka Egawa; Yukio Endo; Tetsuya Yamaguchi; Yoshinori Iida; Akihiko Furukawa; Sohei Manabe; Y. Ishizuka; H. Ichinose; T. Niiyama; Hisanori Ihara; Hidetoshi Nozaki; I. Yanase; Naoshi Sakuma; Takeo Sakakubo; Hiroto Honda; F. Masuoka; O. Yoshida; Hiroyuki Tango; S. Sano

A 2/3-in optical format 2 M pixel STACK-CCD imager has been developed. The STACK-CCD imager, overlaid with an amorphous silicon photoconversion layer, realizes a large signal charge handling capability of 1.0/spl times/10/sup 5/ electrons, a -140 dB smear noise and a 90 dB dynamic range with a newly introduced device configuration and its unique operation. The 5.0 /spl mu/m(H)/spl times/5.2 /spl mu/m(V) unit pixel imager with sufficiently low image lag has been realized by a novel bias charge injection scheme These device performances are the best ever achieved by a CCD HDTV imager. This is the first such imager satisfying the device performances required for a practical use 2/3-in 2 M pixel HDTV imager. >


international electron devices meeting | 1994

A low driving voltage CCD with single layer electrode structure for area image sensor

Nagataka Tanaka; Nobuo Nakamura; Yoshiyuki Matsunaga; Sohei Manabe; Hiroyuki Tango; Okio Yoshida

A new single layer electrode two-phase CCD was studied for the purpose of realizing low driving voltage operation in inter-line transfer CCD (IT-CCD) image sensor aiming for low power consumption. Conventional H-CCD with overlapping double layer electrode structure have not achieved signal charge transfer at very low driving voltage below 2 V due to appearance of potential pocket under the inter-electrode gap yet. The new CCD employs a new channel doping profile for potential pocket suppression at the inter-electrode gap. The new CCD also employs a stepped-oxide structure having a single layer transfer electrode covering both a thin gate oxide forming storage region and a thinner gate oxide forming barrier region. The inter-electrode gap of single layer electrode was decreased to as small as 0.3 /spl mu/m. As a result of these measures, a fabricated 1/3 in format 270 K pixel IT-CCD image sensor reproduces a fine video image even when it is operated at a driving voltage as low as 1.8 V.


IEEE Transactions on Electron Devices | 1992

Analysis of low signal level characteristics for high-sensitivity CCD charge detector

Shinji Ohsawa; Yoshiyuki Matsunaga

Low signal level characteristics for a highly sensitive floating surface amplifier (FSA) have been analyzed using a two-dimensional device simulator. The linearity, within 5% variance of charge/voltage conversion ratio from 0.5 to 4000 signal electrons, has been confirmed with this simulation. This result shows that it is possible to make the charge/voltage conversion ratio under 10 signal electrons linear for an actual amplifier. Furthermore, it is shown to be possible to improve the charge/voltage conversion ratio by a factor of 2 over that of the fabricated device. >


international solid-state circuits conference | 1995

A single-layer metal-electrode CCD image sensor

Nobuo Nakamura; Nagataka Tanaka; N. Endoh; Yoshiyuki Matsunaga; Michio Sasaki; Hirofumi Yamashita; Shinji Ohsawa; Sohei Manabe; Okio Yoshida

A small pixel is required to reduce CCD image sensor chip size for commercial application. However, the shrinkage of pixel size adversely affects such characteristics as smear noise, sensitivity and charge-handling capability. Furthermore, a conventional overlapping double-layer polysilicon (polySi) electrode is complicated and difficult to fabricate for CCD image sensors. For process step simplicity of the transfer electrodes, aiming at low cost sensors and the smear noise reduction, a single-layer metal-electrode CCD image sensor is introduced.


IEEE Transactions on Electron Devices | 1997

Analysis of low fixed pattern noise cell structures for photoconversion layer overlaid CCD or CMOS image sensors

Shinji Ohsawa; Michio Sasaki; Ryohei Miyagawa; Yoshiyuki Matsunaga

A new low fixed pattern noise (FPN) cell structure, which can be used for photoconversion layer overlaid CCD or CMOS image sensors, was proposed and analyzed with a two-dimensional (2-D) device simulator. One of the most serious problems for this type of image sensor is the mixing of signal charges of neighboring cells during signal charge readout. The magnitude of signal mixing was as much as 20% for the conventional 2/3-in 2-million pixel STACK-CCD cell structure. FPN was very visible as a result of this signal mixing. This time, a new cell structure was proposed and analyzed to reduce signal mixing and FPN. It was possible to reduce signal mixing to a low value of 0.7% of the signal level using the new cell structure.


IEEE Journal of Solid-state Circuits | 1991

A 1/3-in interline transfer CCD image sensor with a negative-feedback-type charge detector

Yoshiyuki Matsunaga; Shinji Ohsawa

The authors describe an interline transfer charge coupled device (CCD) area image sensor with 94-dB dynamic range and 1.0-electron RMS noise charge detector. With a new capacitance-coupled negative-feedback configuration, the saturation level of the detector is successfully extended by a factor of five, maintaining the superior low-noise characteristics. The imager with this detector has 398 (H)*492 (V) pixels in 1/3-in format image size. Moreover, 1/f noise in the output signal is successfully suppressed with a new alternate gain inversion (AGI) signal processing. >

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