Keizo Hirose | Researchain

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Archive | 2001

Plasma treatment method and apparatus

Masayuki Tomoyasu; Akira Koshiishi; Kosuke Imafuku; Shosuke Endo; Kazuhiro Tahara; Yukio Naito; Kazuya Nagaseki; Keizo Hirose; Mitsuaki Komino; Hiroto Takenaka; Hiroshi Nishikawa; Yoshio Sakamoto

Archive | 2001

Plasma treatment apparatus and method

Takao Sakamoto; Kazuhiro Tahara; Kenji Momose; Kosuke Imafuku; Shosuke Endo; Yukio Naito; Kazuya Nagaseki; Keizo Hirose

Archive | 1998

Apparatus and method for forming liquid film

Nobuo Konishi; Keizo Hirose

Archive | 2000

Apparatus for plasma processing

Akira Koshiishi; Keizo Hirose

Archive | 1998

Process solution supplying apparatus

Nobuo Konishi; Keizo Hirose

Archive | 1998

Plasma treatment method utilizing an amplitude-modulated high frequency power

Masayuki Tomoyasu; Akira Koshiishi; Kosuke Imafuku; Shosuke Endo; Kazuhiro Tahara; Yukio Naito; Kazuya Nagaseki; Keizo Hirose; Mitsuaki Komino; Hiroto Takenaka; Hiroshi Nishikawa; Yoshio Sakamoto

Archive | 2000

Substrate washing method

Keizo Hirose; Kenji Sekiguchi

Archive | 1995

Plasma treatment device, processing device and etching device

Shiyousuke Endou; Yoshio Fukazawa; Keizo Hirose; Kosuke Imafuku; Isao Kobayashi; Akira Koshiishi; Kazuya Nagaseki; Yukio Naito; Tatsu Nonaka; Kazuhiro Tawara; Masayuki Tomoyasu; Hiroshi Tsuchiya; 光祐今福; 幸男内藤; 昌幸友安; 浩土屋; 功小林; 圭三広瀬; 一也永関; 義男深澤; 一弘田原; 公輿石; 昇佐遠藤; 龍野中

Archive | 1998