Lambert Danner
Leica Microsystems
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Lambert Danner.
Proceedings of SPIE, the International Society for Optical Engineering | 2006
Thomas Sure; Lambert Danner; Peter Euteneuer; Gerhard Hoppen; Armin Pausch; Wolfgang Vollrath
During the last years, new microscope applications require an increased resolution which enforces the development of new state of the art high NA immersion objectives. With the introduction of the 4Pi confocal fluorescence microscope, the increase of the numerical aperture from NA=1.4 to NA=1.46 makes sense, although the gain of lateral resolution is quite small. On the other hand, for inspection and metrology in the semiconductor industry the continuously decreasing structures need the highest possible resolution, which can be achieved with high NA water immersion objectives working in the DUV wavelength range. Building this kind of objectives requires special measuring and testing technologies and a manufacturing precision which has never been realized before in series production.
Archive | 2001
Hakon Mikkelsen; Horst Engel; Lambert Danner; Christof Stey
Archive | 2003
Franz Dr. Cemic; Lambert Danner; Uwe Graf; Robert Mainberger; Dirk Sönksen; Volker Knorz
Archive | 2001
Lambert Danner; Joachim Wienecke
Archive | 2005
Klaus Rinn; Lambert Danner
Archive | 2005
Uwe Graf; Lambert Danner
Archive | 2001
Franz Dr. Cemic; Lambert Danner; Gerhard Hoppen
Archive | 2003
Franz Dr. Cemic; Lambert Danner; Robert Mainberger; Michael Veith; Martin Osterfeld; Uwe Graf
Archive | 2003
Franz Dr. Cemic; Lambert Danner; Uwe Graf; Volker Knorz; Robert Mainberger; Dirk Sönksen
Archive | 2000
Lambert Danner; Frank Eisenkrämer; Michael Veith; Wolfgang Vollrath; Martin Osterfeld