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Dive into the research topics where Lawrence D. Rotter is active.

Publication


Featured researches published by Lawrence D. Rotter.


Archive | 2002

Measurement system with separate optimized beam paths

David Y. Wang; Lawrence D. Rotter; Jeffrey T. Fanton; Jeffrey E. Mcaninch


Archive | 2002

Diffractive optical elements and grid polarizers in focusing spectroscopic ellipsometers

Lawrence D. Rotter; David Y. Wang


Archive | 2011

DISCRETE POLARIZATION SCATTEROMETRY

Andrew V. Hill; Amnon Manassen; Daniel Kandel; Vladimir Levinski; Joel L. Seligson; Alexander Svizher; David Y. Wang; Lawrence D. Rotter; Johannes D. De Veer


Archive | 2013

Calibration Of An Optical Metrology System For Critical Dimension Application Matching

Klaus Flock; Lawrence D. Rotter; M. A. Arain


Archive | 2012

Optical metrology tool equipped with modulated illumination sources

Andrei V. Shchegrov; Lawrence D. Rotter; David Y. Wang; Andrei Veldman; Kevin Peterlinz; Gregory Brady; Derrick Shaughnessy


Archive | 2014

Systems for Providing Illumination in Optical Metrology

Gregory Brady; Andrei V. Shchegrov; Lawrence D. Rotter; Derrick Shaughnessy; Anatoly Shchemelinin; Ilya Bezel; M. A. Arain; Anatoly A. Vasiliev; James Andrew Allen; Oleg Shulepov; Andrew V. Hill; Ohad Bachar; Moshe Markowitz; Yaron Ish-shalom; Ilan Sela; Amnon Manassen; Alexander Svizher; Maxim Khokhlov; Avi Abramov; Oleg Tsibulevsky; Daniel Kandel; Mark Ghinovker


Archive | 2015

MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS

David Y. Wang; Klaus Flock; Lawrence D. Rotter; Shankar Krishnan; Johannes D. De Veer; Catalin Filip; Gregory Brady; M. A. Arain; Andrei V. Shchegrov


Archive | 2003

Flat spectrum illumination source for optical metrology

James Lee Hendrix; David Y. Wang; David M. Aikens; Lawrence D. Rotter; Joel Ng


Archive | 2011

LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM

Guorong V. Zhuang; Shankar Krishnan; Johannes D. De Veer; Klaus Flock; David Y. Wang; Lawrence D. Rotter


Archive | 2009

System and method for performing photothermal measurements and relaxation compensation

Lawrence D. Rotter; David Y. Wang; Derrick Shaughnessy; Mark Senko

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