Layton C. Hale

Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

The success of recent static printing experiments at Lawrence Berkeley National Laboratory’s Advanced Light Source (ALS) using the EUV LLC Engineering Test Stand (ETS) Set-2 optic has demonstrated the utility of synchrotron-based EUV exposure stations. Although not viable light sources for commercial lithography, synchrotrons provide clean, convenient, and extremely flexible sources for developmental microfield lithography. The great flexibility of synchrotron-based illumination arises from the fact that such sources facilitate active coherence reduction, thus enabling the coherence function, or pupil fill, to be actively sculpted in real time. As the commercialization of EUV progresses, the focus of developmental EUV lithography is shifting from low numerical aperture (NA) tools such as the 0.1-NA ETS to higher-NA tools such as the 0.3-NA Micro Exposure Tool (MET). To support printing with MET optics at the ALS, a new printing station has been developed, relying on a scanning illuminator to provide programmable coherence (pupil-fill) control. The illuminator is designed to operate up to a coherence factor (s) of 1 and support the full 200′600 design printed field of view. In addition to a new illuminator design, new focus sensing and dose-control systems have also been implemented. Here we describe the MET printing capabilities in detail and present preliminary printing results with the Sematech Set-2 MET optic.

Optimal design techniques for kinematic couplings

Abstract Kinematic couplings are well known to the precision engineering community as simple devices that provide rigid, repeatable connection between two objects through usually six local contact areas. They serve many applications that require 1) separation and repeatable engagement, and/or 2) minimum influence that an imprecise or unstable foundation has on the stability of a precision component. Typically, the coupling design process starts by arranging or adapting one of two classic configurations, the three-vee coupling or the tetrahedron-vee-flat coupling, to suit the geometry of the application. It is often sufficient to analyze only the contact stresses and perhaps the coupling stiffness when the configuration remains fairly conventional (i.e., planar) and the application is not particularly demanding. Otherwise, effort spent optimizing the configuration through additional analysis and/or testing is well worthwhile. This paper proposes several optimization criteria and presents analysis techniques for optimizing kinematic coupling designs. The general modeling approach uses [6 × 6] transformation matrices to reflect contact stiffness matrices to a common coordinate system where they are added together as a parallel combination, for example. This method has wider applications particularly for flexure systems, which will be the subject of a future article. In addition, the reader may find the kinematic coupling designs presented in this paper useful for future applications.

EUV Engineering Test Stand

The Engineering Test Stand (ETS) is an EUV laboratory lithography tool. The purpose of the ETS is to demonstrate EUV full-field imaging and provide data required to support production-tool development. The ETS is configured to separate the imaging system and stages from the illumination system. Environmental conditions can be controlled independently in the two modules to maximize EUV throughput and environmental control. A source of 13.4 nm radiation is provided by a laser plasma source in which a YAG laser beam is focused onto a xenon-cluster target. A condenser system, comprised of multilayer-coated mirrors and grazing-incidence mirrors, collects the EUV radiation and directs it onto a reflecting reticle. A four-mirror, ring-field optical system, having a numerical aperture of 0.1, projects a 4x-reduction image onto the wafer plane. This design corresponds to a resolution of 70 nm at a k1 of 0.52. The ETS is designed to produce full- field images in step-and-scan mode using vacuum-compatible, one-dimension-long-travel magnetically levitated stages for both reticle and wafer. Reticle protection is incorporated into the ETS design. This paper provides a system overview of the ETS design and specifications.

System integration and performance of the EUV engineering test stand

The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k1 of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features.

First lithographic results from the extreme ultraviolet Engineering Test Stand

The extreme ultraviolet (EUV) Engineering Test Stand (ETS) is a step-and-scan lithography tool that operates at a wavelength of 13.4 nm. It has been developed to demonstrate full-field EUV imaging and acquire system learning for equipment manufacturers to develop commercial tools. The initial integration of the tool is being carried out using a developmental set of projection optics, while a second, higher-quality, projection optics is being assembled and characterized in a parallel effort. We present here the first lithographic results from the ETS, which include both static and scanned resist images of 100 nm dense and isolated features throughout the ring field of the projection optics. Accurate lithographic models have been developed and compared with the experimental results.

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Static microfield printing capabilities have recently been integrated into the extreme ultraviolet interferometer operating at the Advanced Light Source synchrotron radiation facility at Lawrence Berkeley National Laboratory. The static printing capabilities include a fully programmable scanning illumination system enabling the synthesis of arbitrary illumination coherence (pupil fill). This new exposure station has been used to lithographically characterize the static imaging performance of the Engineering Test Stand Set-2 optic. Excellent performance has been demonstrated down to the 70 nm equal line/space level with focus latitude exceeding 1 μm and dose latitude of approximately 10%. Moreover, equal line/space printing down to a resolution of 50 nm has been demonstrated using resolution-enhancing pupil fills.

The Nuclear Spectroscopic Telescope Array (NuSTAR): optics overview and current status

The Nuclear Spectroscopic Telescope Array (NuSTAR) is a NASA Small Explorer mission scheduled for launch in February 2012. NuSTAR will deploy two imaging CdZnTe spectrometers in the 6-79 keV energy band. The two NuSTAR optics utilize multilayer-coated, thermally-slumped glass integrated into a titanium-glass-epoxy-graphite composite structure, along with an extendable mast, to obtain 10.15 meter focal length. Using this approach, the NuSTAR optics will obtain subarcminute imaging with large effective area over its entire energy band. NuSTARs conic-approximation Wolter-I optics are the first true hard X-ray focusing optics to be deployed on a satellite experiment. We report on the design of the NuSTAR optics, present the status of the two flight optics under construction, and report preliminary measurements that can be used to predict performance.

Fabrication of the NuSTAR flight optics

We describe the fabrication of the two NuSTAR flight optics modules. The NuSTAR optics modules are glass-graphiteepoxy composite structures to be employed for the first time in space-based X-ray optics by NuSTAR, a NASA Small Explorer schedule for launch in February 2012. We discuss the optics manufacturing process, the qualification and environmental testing performed, and briefly discuss the results of X-ray performance testing of the two modules. The integration and alignment of the completed flight optics modules into the NuSTAR instrument is described as are the optics module thermal shields.

NuSTAR hard x-ray optics design and performance

The Nuclear Spectroscopic Telescope Array (NuSTAR) is a NASA satellite mission scheduled for launch in 2011. Using focusing optics with multilayer coating for enhanced reflectivity of hard X-rays (6-79 keV), NuSTAR will provide a combination of clarity, sensitivity and spectral resolution surpassing the largest observatories in this band by orders of magnitude. This advance will allow NuSTAR to test theories of how heavy elements are born, discover collapsed stars and black holes on all scales and explore the most extreme physical environments. We will present an overview of the NuSTAR optics design and production process and detail the optics performance.

Initial results from the EUV engineering test stand

The Engineering Test Stand (ETS) is an EUV lithography tool designed to demonstrate full-field EUV imaging and provide data required to accelerate production-tool development. Early lithographic results and progress on continuing functional upgrades are presented and discussed. In the ETS a source of 13.4 nm radiation is provided by a laser plasma source in which a Nd:YAG laser beam is focused onto a xenon- cluster target. A condenser system, comprised of multilayer-coated and grazing incidence mirrors, collects the EUV radiation and directs it onto a reflecting reticle. The resulting EUV illumination at the reticle and pupil has been measured and meets requirements for acquisition of first images. Tool setup experiments have been completed using a developmental projection system with (lambda) /14 wavefront error (WFE), while the assembly and alignment of the final projection system with (lambda) /24 WFE progresses in parallel. These experiments included identification of best focus at the central field point and characterization of imaging performance in static imaging mode. A small amount of astigmatism was observed and corrected in situ, as is routinely done in advanced optical lithographic tools. Pitch and roll corrections were made to achieve focus throughout the arc-shaped field of view. Scan parameters were identified by printing dense features with varying amounts of magnification and skew correction. Through-focus scanned imaging results, showing 100 nm isolated and dense features, will be presented. Phase 2 implementation goals for the ETS will also be discussed.