Li-Qun Xia

Methods and apparatus for cleaning surfaces in a substrate processing system

Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound

Multistep chamber cleaning and film deposition process using a remote plasma that also enhances film gap fill

Method and apparatus for gettering fluorine from chamber material surfaces

Method for cleaning a process chamber

Method of depositing low k films using an oxidizing plasma

Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide film

Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films

Methods for shallow trench isolation

Dielectric film deposition employing a bistertiarybutylaminesilane precursor