Srinivas D. Nemani
Applied Materials
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Publication
Featured researches published by Srinivas D. Nemani.
international interconnect technology conference | 2013
N. Posseme; L. Vallier; Chia-Ling Kao; C. Licitra; C. Petit-Etienne; C. Mannequin; P. Gonon; Sergey Belostotskiy; S. Banola; O. Joubert; Srinivas D. Nemani
Today porous SiOCH combined with metallic hard masking strategy is an integration of choice for advanced BEOL interconnect technology node. However in this context the main integration issue is the dielectric film sensitivity to fluorocarbon (FC) etch chemistry. In this study, new FC free etching chemistry has been proposed as breakthrough solution. Based on pattern and blanket film analyses, the benefits of this new chemistry is presented and discussed with respect to conventional FC etching. Its compatibility with metallic hard mask integration and wet cleaning is also evaluated.
Archive | 1996
Gary Fong; Li-Qun Xia; Srinivas D. Nemani; Ellie Yieh
Archive | 2007
Jeffrey C. Munro; Srinivas D. Nemani
Archive | 1999
Farhad Moghadam; David Cheung; Ellie Yieh; Li-Qun Xia; Wai-Fan Yau; Chi-I Lang; Shin-Puu Jeng; Frederic Gaillard; Shankar Venkataraman; Srinivas D. Nemani
Archive | 2002
Ju-hyung Lee; Ping Xu; Shankar Venkataraman; Li-Qun Xia; Fei Han; Ellie Yieh; Srinivas D. Nemani; Kangsub Yim; Farhad Moghadam; Ashok K. Sinha; Yi Zheng
Archive | 2003
Francimar Campana; Srinivas D. Nemani; Michael Chapin; Shankar Venkataraman
Archive | 2002
Srinivas D. Nemani; Li-Qun Xia; Ellie Yieh
Archive | 2010
Abhijit Basu Mallick; Srinivas D. Nemani; Ellie Yieh
Archive | 1996
Li-Qun Xia; Visweswaren Sivaramakrishnan; Srinivas D. Nemani; Ellie Yieh; Gary Fong
Archive | 2007
Abhijit Basu Mallick; Jeffrey C. Munro; Linlin Wang; Srinivas D. Nemani; Yi Zheng; Zheng Yuan; Dimitry Lubomirsky; Ellie Yieh
