Lindsay Hussey

Lasing and longitudinal cavity modes in photo-pumped deep ultraviolet AlGaN heterostructures

To unambiguously distinguish lasing from super luminescence, key elements of lasing such as longitudinal cavity modes with narrow line-width, polarized emission, and elliptically shaped far-field pattern, need to be demonstrated at the same time. Here, we show transverse electric polarized lasing at 280.8 nm and 263.9 nm for AlGaN based multi-quantum-wells and double heterojunction structures fabricated on single crystalline AlN substrates. An elliptically shaped far-field pattern was recorded when pumped above threshold. With cavities shorter than 200 μm, well-defined, equally spaced longitudinal modes with line widths as narrow as 0.014 nm were observed. The low threshold pumping density of 84 kW/cm2 suggests that the electrically pumped sub-300 nm ultraviolet laser diodes are imminent.

Strain in Si doped GaN and the Fermi level effect

Using high resolution x-ray diffraction and Hall effect measurements, we found that the tensile strain caused by dislocation inclination in Si doped GaN became immeasurable when carbon codoping was used to compensate the free carriers. This result suggested that the tensile strain is related to free carrier concentration instead of Si concentration. Such an effect could be explained by the Fermi level effect on the surface-mediated dislocation climb governed by Ga vacancies, whose concentration is strongly influenced by the Fermi level position. This phenomenon is possibly similar to the well-known Fermi level effect in GaAs and GaP systems.

Polarity control and growth of lateral polarity structures in AlN

The control of the polarity of metalorganic chemical vapor deposition grown AlN on sapphire is demonstrated. Al-polar and N-polar AlN is grown side-by-side yielding a lateral polarity structure. Scanning electron microscopy measurements reveal a smooth surface for the Al-polar and a relatively rough surface for the N-polar AlN domains. Transmission electron microscopy shows mixed edge-screw type dislocations with polarity-dependent dislocation bending. Raman spectroscopy reveals compressively strained Al-polar and relaxed N-polar domains. The near band edge luminescence consists of free and bound excitons which are broadened for the Al-polar AlN. Relaxation, better optical quality, and dislocation bending in the N-polar domains are explained by the columnar growth mode.

Directed self-assembly of quantum structures by nanomechanical stamping using probe tips

We demonstrate that nanomechanically stamped substrates can be used as templates to pattern and direct the self-assembly of epitaxial quantum structures such as quantum dots. Diamond probe tips are used to indent or stamp the surface of GaAs(100) to create nanoscale volumes of dislocation-mediated deformation, which alter the growth surface strain. These strained sites act to bias nucleation, hence allowing for selective growth of InAs quantum dots. Patterns of quantum dots are observed to form above the underlying nanostamped template. The strain state of the patterned structures is characterized by micro-Raman spectroscopy. The potential of using nanoprobe tips as a quantum dot nanofabrication technology are discussed.

The effect of polarity and surface states on the Fermi level at III-nitride surfaces

Surface states and their influence on the Fermi level at the surface of GaN and AlN are studied using x-ray photoelectron spectroscopy (XPS). The effect of polarity on surface electronic properties was studied. Accurate modeling of the valence band edge and comparison with XPS data revealed the presence of donor surface states at 1.4 eV and acceptor states at energies >2.7 eV from the valence band in GaN. Al polar AlN showed acceptor states at energies >3.3 eV. Density of acceptor surface states was estimated to be between 1013 and 1014 eV−1 cm−2 in both GaN and AlN. The shift in charge neutrality levels and barrier heights due to polarity and the density of surface states on AlN and GaN were estimated from XPS measurements. Theoretical modeling and comparison with XPS data implied full compensation of spontaneous polarization charge by charged surface states. Barrier height measurements also reveal a dependence on polarity with ϕmetal-polar >  ϕnon-polar >  ϕnitrogen-polar suggesting that the N-polar sur...

Stimulated emission and optical gain in AlGaN heterostructures grown on bulk AlN substrates

Optical gain spectra for ∼250 nm stimulated emission were compared in three different AlGaN-based structures grown on single crystalline AlN substrates: a single AlGaN film, a double heterostructure (DH), and a Multiple Quantum Well (MQW) structure; respective threshold pumping power densities of 700, 250, and 150 kW/cm2 were observed. Above threshold, the emission was transverse-electric polarized and as narrow as 1.8 nm without a cavity. The DH and MQW structures showed gain values of 50–60 cm−1 when pumped at 1 MW/cm2. The results demonstrated the excellent optical quality of the AlGaN-based heterostructures grown on AlN substrates and their potential for realizing electrically pumped sub-280 nm laser diodes.

Strain relaxation by pitting in AlN thin films deposited by metalorganic chemical vapor deposition

Strain relaxation mechanisms were investigated in epitaxial AlN layers deposited on (0001)-oriented AlN substrates by metalorganic chemical vapor deposition. It was revealed that epitaxial AlN layers under tensile strain can exhibit micro-cracks and nano-pits. A correlation existed between the amount of strain and number of pits in localized areas. Pit densities as high as 1010 cm−2 were observed in areas where the tensile strain reached ∼0.4%, while unstrained areas of the film showed step flow growth. These nano-pits occurred as a strain relaxation mechanism and were not related to intrinsic defects, such as threading dislocations or inversion domains.

Fermi level control of compensating point defects during metalorganic chemical vapor deposition growth of Si-doped AlGaN

A Fermi-level control scheme for point defect management using above-bandgap UV illumination during growth is presented. We propose an extension to the analogy between the Fermi level and the electrochemical potential such that the electrochemical potential of a charged defect in a material with steady-state populations of free charge carriers may be expressed in terms of the quasi-Fermi levels. A series of highly Si-doped Al0.65Ga0.35N films grown by metalorganic chemical vapor deposition with and without UV illumination showed that samples grown under UV illumination had increased free carrier concentration, free carrier mobility, and reduced midgap photoluminescence all indicating a reduction in compensating point defects.

On the strain in n-type GaN

It was demonstrated that Ge has the same effect as Si on the strain evolution in n-type GaN as measured by x-ray diffraction. Dislocation inclination, which causes tensile strain in n-type GaN, was clearly observed by transmission electron microscopy where Ge doping was introduced during epitaxial growth. This result is explained by the Fermi level effect model that indicates dislocation inclination due to the climbing process through Ga vacancies. Therefore, there is no dependence of dislocation inclination on dopant species.

KOH based selective wet chemical etching of AlN, AlxGa1−xN, and GaN crystals: A way towards substrate removal in deep ultraviolet-light emitting diode

A controllable and smooth potassium hydroxide-based wet etching technique was developed for the AlGaN system. High selectivity between AlN and AlxGa1−xN (up to 12×) was found to be critical in achieving effective substrate thinning or removal for AlGaN-based deep ultraviolet light emitting diodes, thus increasing light extraction efficiency. The mechanism of high selectivity of AlGaN as a function of Al composition can be explained as related to the formation and dissolution of oxide/hydroxide on top of N-polar surface. Cross-sectional transmission electron microscopic analysis served as ultimate proof that these hillocks were not related to underlying threading dislocations.