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Dive into the research topics where Liu Biwei is active.

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Featured researches published by Liu Biwei.


IEEE Transactions on Nuclear Science | 2008

Temperature Dependence of Digital SET Pulse Width in Bulk and SOI Technologies

Chen Shuming; Liang Bin; Liu Biwei; Liu Zheng

Using three-dimensional mixed-mode simulation, temperature dependence of digital SET pulse width in bulk and PD SOI inverter chains has been studied. It was found that temperature has a very important impact on digital SET. Using a LET of 60 MeVmiddotcm2 /mg, when temperature rises from -55 to 125degC , the digital SET pulse width in bulk and floating SOI inverter chains rises remarkably, while in a SOI inverter chain with ideal body tie, the digital SET pulse width is almost constant with rising temperature. Detailed analysis showed that pulse broadening with rising temperature is primarily due to enhancement of bipolar amplification.


IEEE Transactions on Nuclear Science | 2012

Impact of Circuit Placement on Single Event Transients in 65 nm Bulk CMOS Technology

He Yibai; Chen Shuming; Chen Jianjun; Chi Yaqing; Liang Bin; Liu Biwei; Qin Jun-Rui; Du Yankang; Huang Pengcheng

Heavy ion experiments on 65 nm bulk CMOS inverter chains demonstrate the impact of circuit placement on single-event transients (SETs). Experimental data and simulations show that the horizontal placement design significantly reduces the SET pulse width and SET cross-section compared to the vertical placement design due to the existence of pulse quenching.


IEEE Transactions on Nuclear Science | 2009

The Effect of Re-Convergence on SER Estimation in Combinational Circuits

Liu Biwei; Chen Shuming; Liang Bin; Liu Zheng; Zhao Zhenyu

Detailed analysis is presented on the effect of re-convergence on SER estimation in combinational circuits. The results show that the ignoring of re-convergence by previous independent pulse methods introduces significant errors in SER results. Furthermore, independent pulse methods miscalculate the SET sensitive nodes, leading to improper hardening strategy.


Microelectronics Journal | 2013

Impact of pulse quenching effect on soft error vulnerabilities in combinational circuits based on standard cells

Du Yankang; Chen Shuming; Liu Biwei

In this study, we investigated the impact of pulse quenching effect on the soft error vulnerabilities in combinational circuits. Simulation results illustrate that soft error vulnerabilities could be reduced by 4–16% for the benchmark circuits when the pulse quenching effect is introduced. By adjusting the cell orientations of the quenching cells in the layout, the soft error vulnerabilities could be further reduced. It is suggested that new placement algorithm considering circuit reliability should be designed to reduce the circuit soft error vulnerabilities. & 2012 Elsevier Ltd. All rights reserved.


Science China-technological Sciences | 2013

Novel N-hit single event transient mitigation technique via open guard transistor in 65 nm bulk CMOS process

Huang Pengcheng; Chen Shuming; Chen Jianjun; Liu Biwei

In this paper, we proposed a new n-channel MOS single event transient (SET) mitigation technique, which is called the open guard transistor (OGT) technique. This hardening scheme is compared with several classical n-channel MOS hardening structures through 3-D TCAD simulations. The results show that this scheme presents about 35% improvements over the unhardened scheme for mitigating the SET pulse, and its upgrade, the 2-fringe scheme, takes on even more than 50% improvements over the unhardened one. This makes significant sense for the semi-conductor device reliability.


Science China-technological Sciences | 2012

The effect of P + deep well doping on SET pulse propagation

Qin Jun-Rui; Chen Shuming; Liu Biwei; Liu FanYu; Chen Jianjun

The change of P+ deep well doping will affect the charge collection of the active and passive devices in nano-technology, thus affecting the propagated single event transient (SET) pulsewidths in circuits. The propagated SET pulsewidths can be quenched by reducing the doping of P+ deep well in the appropriate range. The study shows that the doping of P+ deep well mainly affects the bipolar amplification component of SET current, and that changing the P+ deep well doping has little effect on NMOS but great effect on PMOS.


Chinese Physics B | 2012

Recovery of single event upset in advanced complementary metal—oxide semiconductor static random access memory cells

Qin Jun-Rui; Chen Shuming; Liang Bin; Liu Biwei

Using computer-aided design three-dimensional (3D) simulation technology, the recovery mechanism of single event upset and the effects of spacing and hit angle on the recovery are studied. It is found that the multi-node charge collection plays a key role in recovery and shielding the charge sharing by adding guard rings. It cannot exhibit the recovery effect. It is also indicated that the upset linear energy transfer (LET) threshold is kept constant while the recovery LET threshold increases as the spacing increases. Additionally, the effect of incident angle on recovery is analysed and it is shown that a larger angle can bring about a stronger charge sharing effect, thus strengthening the recovery ability.


Journal of Semiconductors | 2010

Hot carrier effects of SOI NMOS

Chen Jianjun; Chen Shuming; Liang Bin; Liu Biwei; Liu Zheng; Teng Zheqian

Hot carrier effect (HCE) is studied on annular NMOS and two-edged NMOS such as H-shape gate NMOS, T-shape gate NMOS and common two-edged NMOS. Based on the chemical reaction equation of HCE degradation and a geometry dependent reaction diffusion equation, a HCE degradation model for annular NMOS and two-edged NMOS is proposed. According to this model, we conclude that the time exponent of the threshold voltage degradation depends on the configuration of the gate, and annular NMOS has more serious HCE degradation than two-edged NMOS. The design, fabrication and HCE experiments of these NMOS in a 0.5-μm PD SOI process verify the correctness of the conclusion.


Chinese Physics B | 2012

Temperature and drain bias dependence of single event transient in 25-nm FinFET technology

Qin Jun-Rui; Chen Shuming; Li Da-Wei; Liang Bin; Liu Biwei

In this paper, we investigate the temperature and drain bias dependency of single event transient (SET) in 25-nm fin field-effect-transistor (FinFET) technology in a temperature range of 0–135 °C and supply voltage range of 0.4 V–1.6 V. Technology computer-aided design (TCAD) three-dimensional simulation results show that the drain current pulse duration increases from 0.6 ns to 3.4 ns when the temperature increases from 0 to 135 °C. The charge collected increases from 45.5 fC to 436.9 fC and the voltage pulse width decreases from 0.54 ns to 0.18 ns when supply voltage increases from 0.4 V to 1.6 V. Furthermore, simulation results and the mechanism of temperature and bias dependency are discussed.


ieee region 10 conference | 2008

Coupled SET pulses modeling based on LUT in ultra deep submicron technology

Chen Shuming; Liu Biwei; Liang Bin

Soft error induced by SET (single event transient) has been more and more substantial. It has been proved that previously decoupled SET pulse models will induce great error, such as double exponential model and piecewise linear model. In this paper, we present a novel LUT (look up table) based SET pulse model which can reflect the coupled effect of charge collection and circuit response. We realize this model in SPICE circuit simulator. Experiments show that the SET pulses obtained by our methods agree with device/circuit mix-mode simulation, and our method is much faster.

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Chen Shuming

National University of Defense Technology

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Liang Bin

National University of Defense Technology

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Chi Yaqing

National University of Defense Technology

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Qin Jun-Rui

National University of Defense Technology

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Guo Yang

National University of Defense Technology

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Hu Chunmei

National University of Defense Technology

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Li Zhentao

National University of Defense Technology

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Du Yankang

National University of Defense Technology

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He Yibai

National University of Defense Technology

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