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Luis-Felipe Giles

Infineon Technologies

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Publication

Featured researches published by Luis-Felipe Giles.

Archive | 2007

Device Design Evaluation of Multigate FETs Using Full 3D Process and Device TCAD Simulation

Muhammad Nawaz; Stefan Decker; Luis-Felipe Giles; Wolfgang Molzer; Thomas Schulz; Klaus Schrüfer; Reinhard Mahnkopf

Full 3D numerical process and device simulations have been performed in order to optimize device design of multigate FETs (MuGFETs) and the underlying fabrication processes. At first process simulation parameters have been calibrated to measurement data of pre-development process results. Based on this, device electrical performance has been assessed for different gate length, fin doping, implant conditions, fin height, fin width, gate oxide and box thickness by means of typical device parameters.

Microelectronic Engineering | 2008

Evaluation of process parameter space of bulk FinFETs using 3D TCAD

Muhammad Nawaz; Stefan Decker; Luis-Felipe Giles; Wolfgang Molzer; Thomas Schulz

Archive | 2006

METHOD OF PRODUCING A SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR ELEMENT

Luis-Felipe Giles

Microelectronics Journal | 2007

On the device design assessment of multigate FETs (MuGFETs) using full process and device simulation with 3D TCAD

Muhammad Nawaz; Wolfgang Molzer; Stefan Decker; Luis-Felipe Giles; Thomas Schulz

Archive | 2007

FIELD EFFECT TRANSISTOR ARRANGEMENT AND METHOD OF PRODUCING A FIELD EFFECT TRANSISTOR ARRANGEMENT

Karl Hofmann; Luis-Felipe Giles

Archive | 2007

Method of Producing a Semiconductor Element in a Substrate

Luis-Felipe Giles; Matthias Goldbach; Martin Bartels; Paul Kuepper

Archive | 2006

Method of producing a semiconductor element

Luis-Felipe Giles

Archive | 2008

Method for Fabricating a Semiconductor Element, and Semiconductor Element

Luis-Felipe Giles; Thomas Hoffmann; Chris Stapelmann

Archive | 2007

Method of Producing a Semiconductor Element in a Substrate and a Semiconductor Element

Luis-Felipe Giles

Archive | 2007

Production process for a semiconductor element in a substrate implants dopant atoms to give defects and removes some using micro cavities

Luis-Felipe Giles

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Collaboration

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Chris Stapelmann

Infineon Technologies

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Karl Hofmann

Infineon Technologies

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Rainer Liebmann

Infineon Technologies

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Frank Lau

Infineon Technologies

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Muhammad Nawaz

Infineon Technologies

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Stefan Decker

Infineon Technologies

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Thomas Schulz

Infineon Technologies

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Wolfgang Molzer

Infineon Technologies

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Thomas Hoffmann

Katholieke Universiteit Leuven

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Klaus Schrüfer

Infineon Technologies

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