M. D. Newton
Raytheon
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Featured researches published by M. D. Newton.
Infrared Technology and Applications XXX | 2004
David J. Gulbransen; Stephen H. Black; A. C. Childs; Christopher L. Fletcher; S. M. Johnson; W. A. Radford; G. M. Venzor; J. P. Sienicki; A. D. Thompson; J. H. Griffith; A. A. Buell; M. F. Vilela; M. D. Newton; Edward H. Takken; James R. Waterman; Keith Krapels
The Navy faces an ever evolving threat scenario, ranging from sub-sonic sea skimming cruise missiles to newer, unconventional threats such as that experienced by the USS Cole. Next generation naval technology development programs are developing “stealthy” ships by reducing a ships radar cross section and controlling electromagnetic emissions. To meet these threat challenges in an evolving platform environment, ONR has initiated the “Wide Aspect MWIR Array” program. In support of this program, Raytheon Vision Systems (RVS) is developing a 2560 X 512 element focal plane array, utilizing Molecular Beam Epitaxially grown HgCdTe on silicon detector technology. RVS will package this array in a sealed Dewar with a long-life cryogenic cooler, electronics, on-gimbal power conditioning and a thermal reference source. The resulting sub system will be a component in a multi camera distributed aperture situation awareness sensor, which will provide continuous surveillance of the horizon. We will report on the utilization of MWIR Molecular Beam Epitaxial HgCdTe on Silicon material for fabrication of the detector arrays. Detector arrays fabricated on HgCdTe/Si have no thermal expansion mismatch relative to the readout integrated circuits. Therefore large-area focal plane arrays (FPAs) can be developed without concern for thermal cycle reliability. In addition these devices do not require thinning or reticulation like InSb FPAs to yield the high levels of Modulation Transfer Function (MTF) required by a missile warning sensor. HgCdTe/Si wafers can be scaled up to much larger sizes than the HgCdTe/CdZnTe wafers. Four-inch-diameter HgCdTe/Si wafers are currently being produced and are significantly larger than the standard 1.7 inch x 2.6 inch HgCdTe/CdTe wafers. The use of Si substrates also enables the use of automated semiconductor fabrication equipment.
Optical Science and Technology, SPIE's 48th Annual Meeting | 2003
E. P. G. Smith; L. T. Pham; G. M. Venzor; Elyse Norton; M. D. Newton; Paul Goetz; Valerie Randall; Gregory K. Pierce; E. A. Patten; Raymond A. Coussa; Ken Kosai; W. A. Radford; John Edwards; S. M. Johnson; Stefan T. Baur; J. A. Roth; Brett Z. Nosho; John E. Jensen; Randolph E. Longshore
Raytheon Vision Systems (RVS) in collaboration with HRL Laboratories is contributing to the maturation and manufacturing readiness of third-generation two-color HgCdTe infrared staring focal plane arrays (FPAs). This paper will highlight data from the routine growth and fabrication of 256x256 30μm unit-cell staring FPAs that provide dual-color detection in the mid-wavelength infrared (MWIR) and long-wavelength infrared (LWIR) spectral regions. FPAs configured for MWIR/MWIR, MWIR/LWIR and LWIR/LWIR detection are used for target identification, signature recognition and clutter rejection in a wide variety of space and ground-based applications. Optimized triple-layer-heterojunction (TLHJ) device designs and molecular beam epitaxy (MBE) growth using in-situ controls has contributed to individual bands in all two-color FPA configurations exhibiting high operability (>99%) and both performance and FPA functionality comparable to state-of-the-art single-color technology. The measured spectral cross talk from out-of-band radiation for either band is also typically less than 10%. An FPA architecture based on a single mesa, single indium bump, and sequential mode operation leverages current single-color processes in production while also providing compatibility with existing second-generation technologies.
Quantum sensing and nanophotonic devices. Conference | 2005
S. M. Johnson; W. A. Radford; A. A. Buell; M. F. Vilela; J. M. Peterson; Jeffrey J. Franklin; R. E. Bornfreund; A. C. Childs; G. M. Venzor; M. D. Newton; E. P. G. Smith; Lee M. Ruzicka; Gregory K. Pierce; D. D. Lofgreen; Terence J. de Lyon; John E. Jensen
HgCdTe offers significant advantages over other semiconductors which has made it the most widely utilized variable-gap material in infrared focal plane array (FPA) technology. However, one of the main limitations of the HgCdTe materials system has been the size of lattice-matched bulk CdZnTe substrates, used for epitaxially-grown HgCdTe, which are 30 cm2 in size for production and have historically been difficult and expensive to scale in size. This limitation does not adequately support the increasing demand for larger FPA formats which now require sizes up to and beyond 2048 x 2048 and only a single die can be printed per wafer. Heteroepitaxial Si-based substrates offer a cost-effective technology that can be more readily scaled to large wafer sizes. Most of the effort in the IR community in the last 10 years has focused on growing HgCdTe directly on (112)Si substrates by MBE. At Raytheon we have scaled the MBE (112)HgCdTe/Si process originally developed at HRL for 3-in wafers, first to 4-in wafers and more recently to 6 in wafers. We have demonstrated a wide range of MWIR FPA formats up to 2560 x 512 in size and have found that their performance is comparable to arrays grown on bulk CdZnTe substrates by either MBE or LPE techniques. More recent work is focused on extending HgCdTe/Si technology to LWIR wavelengths. The goal of this paper is to review the current status of HgCdTe/Si technology both at Raytheon and the published work available from other organizations.
Proceedings of SPIE, the International Society for Optical Engineering | 2006
Richard Olshove; M. D. Newton; James Bangs; Elizabeth Corrales; William D. Ritchie; Brian Starr; Honnavalli R. Vydyanath; Latika S. R. Becker
This paper presents the infrared detector performance improvement accomplishments by Raytheon Vision Systems (RVS) and by AVYD Devices Inc (AVYD). The RVS-AVYD collaboration has resulted in the demonstration of very large imaging focal plane arrays with respectable operability and performance which could potentially be useful in a variety of promising new applications to advance performance capability for future near and short wave infrared imaging missions. This detector design concept potentially permits ultra-small pixel large format imaging capabilities for diffraction limited resolution down to 5μm pitch focal planes. In this paper, we report on the work performed at the RVSs advanced prototype engineering facility, to fabricate planar detector array wafers with a combination of RVSs Hg1-xCdxTe production material growth and detector fabrication processes and AVYDs p-type ion-implantation process. This paper will review the performance of a 20μm pitch 1,024 x 1,024 format SWIR focal plane array. The detector array was fabricated in Hg1-xCdxTe material responsive from near-infrared to 2.5μm cutoff wavelength. Imaging capability was achieved via interconnect bump bond connection of this detector array to an RVS astronomy grade readout chip. These focal plane arrays have exhibited outstanding quantum efficiency uniformity and magnitude over the entire spectral range and in addition, have also exhibited very low leakage current with median values of 0.25 electrons per second. Detector arrays were processed in engineering grade Hg1-xCdxTe epitaxial layers grown with a modified liquid phase epitaxy process on CdZnTe substrates followed by a combination of passivation/ion implantation/passivation steps. This paper will review the detector performance data in detail including the test structure current-voltage plots, spectral cutoff curves, FPA quantum efficiency, and leakage current.
Journal of Electronic Materials | 2004
E. P. G. Smith; L. T. Pham; G. M. Venzor; Elyse Norton; M. D. Newton; P. M. Goetz; Valerie Randall; A. M. Gallagher; Gregory K. Pierce; E. A. Patten; R. A. Coussa; K. Kosai; W. A. Radford; L. M. Giegerich; J. M. Edwards; S. M. Johnson; S. T. Baur; J. A. Roth; Brett Z. Nosho; T. J. de Lyon; J. E. Jensen; R. E. Longshore
Journal of Electronic Materials | 2004
S. M. Johnson; A. A. Buell; M. F. Vilela; J. M. Peterson; J. B. Varesi; M. D. Newton; G. M. Venzor; R. E. Bornfreund; W. A. Radford; E. P. G. Smith; Joseph P. Rosbeck; T. J. de Lyon; J. E. Jensen; Vaidya Nathan
Journal of Electronic Materials | 2004
A. A. Buell; L. T. Pham; M. D. Newton; G. M. Venzor; Elyse Norton; E. P. G. Smith; J. B. Varesi; V. B. Harper; S. M. Johnson; R. A. Coussa; T. De Leon; J. A. Roth; J. E. Jensen
Journal of Electronic Materials | 2007
R. E. Bornfreund; Joe P. Rosbeck; Yen Thai; E. P. G. Smith; D. D. Lofgreen; M. F. Vilela; A. A. Buell; M. D. Newton; Kenneth Kosai; S. M. Johnson; Terry J. De Lyon; John E. Jensen; Meimei Z. Tidrow
Journal of Electronic Materials | 2007
D. D. Lofgreen; M. F. Vilela; E. P. G. Smith; M. D. Newton; D. Beard; S. M. Johnson
Journal of Electronic Materials | 2005
M. F. Vilela; A. A. Buell; M. D. Newton; G. M. Venzor; A. C. Childs; J. M. Peterson; J. J. Franklin; R. E. Bornfreund; W. A. Radford; S. M. Johnson