M Meuris
IMEC
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Publication
Featured researches published by M Meuris.
Journal of The Electrochemical Society | 1996
I. Teerlinck; Paul Mertens; H. F. Schmidt; M Meuris; Mm Heyns
The impact of light on the copper outplating from aqueous 0.5% HF solutions on 10-20 Ω cm (100) silicon wafers is investigated. Illumination is found to drastically increase the copper deposition. A model based on the semiconductor properties of the silicon substrate which describes the copper plating onto silicon is proposed. It is found that the copper deposition onto these silicon surfaces is limited by the minority carrier supply at the wafer surface.
Journal of The Electrochemical Society | 1995
Alp Rotondaro; M Meuris; Hf Schmidt; Mm Heyns; Cor Claeys; Louis Hellemans; Johan Snauwaert
Sensitive light scattering measurements are used to quantify the amount of residues after photoresist stripping on different substrates. The high sensitivity of this technique provides unique information regarding the efficiency of several stripping procedures by identifying photoresist traces that could not be easily detected by other methods. The proposed procedure permits the optimization of photoresist contamination removal steps like dry and wet stripping on a quantitative basis
MRS Proceedings | 1993
Steven Verhaverbeke; Hugo Bender; M Meuris; P.P. Mertens; H.H. Schmidt; Marc Heyns
The SiO 2 etching by HF solutions is studied. A new model for this etching mechanism is developed based on the existence of the dimer of HF, namely H 2 F 2 . Then the hydrogen passivation of the Si surface is investigated. The hydrogen passivation study is found to depend on the etching mechanism. Two extremes are investigated. The buffered HF solution and the concentrated HF solution.
Archive | 1998
Paul Mertens; M Meuris; Marc Heyns
Archive | 1998
Marc Heyns; Paul Mertens; M Meuris
Archive | 1998
Marc Heyns; Paul Mertens; M Meuris; ポウル・メルテンス; マルク・ヘインス; マルク・メーリス
Microelectronic Engineering | 2007
Guy Brammertz; Marc Heyns; M Meuris; Matty Caymax; Dehuai Jiang
Archive | 2007
Marco Scarrozza; Geoffrey Pourtois; Michel Houssa; Andre Stesmans; M Meuris; Marc Heyns
Particles of Surfaces 7: Detection, Adhesion and Removal | 2002
Wim Fyen; Rita Vos; E. Vrancken; Joost Grillaert; M Meuris; Mm Heyns
MRS Proceedings | 1992
Steven Verhaverbeke; Josep Lluis Alay; Paul Mertens; M Meuris; Marc Heyns; Wilfried Vandervorst; M Murrell; C. J Sofield