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Dive into the research topics where M Meuris is active.

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Featured researches published by M Meuris.


Journal of The Electrochemical Society | 1996

Impact of the Electrochemical Properties of Silicon Wafer Surfaces on Copper Outplating from HF Solutions

I. Teerlinck; Paul Mertens; H. F. Schmidt; M Meuris; Mm Heyns

The impact of light on the copper outplating from aqueous 0.5% HF solutions on 10-20 Ω cm (100) silicon wafers is investigated. Illumination is found to drastically increase the copper deposition. A model based on the semiconductor properties of the silicon substrate which describes the copper plating onto silicon is proposed. It is found that the copper deposition onto these silicon surfaces is limited by the minority carrier supply at the wafer surface.


Journal of The Electrochemical Society | 1995

Sensitive Light Scattering as a Semiquantitative Method for Studying Photoresist Stripping

Alp Rotondaro; M Meuris; Hf Schmidt; Mm Heyns; Cor Claeys; Louis Hellemans; Johan Snauwaert

Sensitive light scattering measurements are used to quantify the amount of residues after photoresist stripping on different substrates. The high sensitivity of this technique provides unique information regarding the efficiency of several stripping procedures by identifying photoresist traces that could not be easily detected by other methods. The proposed procedure permits the optimization of photoresist contamination removal steps like dry and wet stripping on a quantitative basis


MRS Proceedings | 1993

HF-last cleanings : a study of the properties with respect to the different variables

Steven Verhaverbeke; Hugo Bender; M Meuris; P.P. Mertens; H.H. Schmidt; Marc Heyns

The SiO 2 etching by HF solutions is studied. A new model for this etching mechanism is developed based on the existence of the dimer of HF, namely H 2 F 2 . Then the hydrogen passivation of the Si surface is investigated. The hydrogen passivation study is found to depend on the etching mechanism. Two extremes are investigated. The buffered HF solution and the concentrated HF solution.


Archive | 1998

Method and apparatus for removing a liquid from a surface of a rotating substrate

Paul Mertens; M Meuris; Marc Heyns


Archive | 1998

Method of removing a liquid from a surface of a rotating substrate

Marc Heyns; Paul Mertens; M Meuris


Archive | 1998

Method and apparatus for removing a liquid from rotating substrate surface

Marc Heyns; Paul Mertens; M Meuris; ポウル・メルテンス; マルク・ヘインス; マルク・メーリス


Microelectronic Engineering | 2007

Comparing GaAs and In0.15Ga0.85As as channel material for alternative substrate CMOS

Guy Brammertz; Marc Heyns; M Meuris; Matty Caymax; Dehuai Jiang


Archive | 2007

First-principles investigation of oxygen adsorption on GaAs(001)

Marco Scarrozza; Geoffrey Pourtois; Michel Houssa; Andre Stesmans; M Meuris; Marc Heyns


Particles of Surfaces 7: Detection, Adhesion and Removal | 2002

Cleaning, rinsing and drying issues in post-Cu CMP cleaning: A case study

Wim Fyen; Rita Vos; E. Vrancken; Joost Grillaert; M Meuris; Mm Heyns


MRS Proceedings | 1992

Surface Characterisation of Si After HF Treatments and its Influence on the Dielectric Breakdown of Thermal Oxides

Steven Verhaverbeke; Josep Lluis Alay; Paul Mertens; M Meuris; Marc Heyns; Wilfried Vandervorst; M Murrell; C. J Sofield

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Marc Heyns

Katholieke Universiteit Leuven

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Paul Mertens

Katholieke Universiteit Leuven

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Marc Heyns

Katholieke Universiteit Leuven

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Florence Bellenger

Katholieke Universiteit Leuven

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Geoffrey Pourtois

Katholieke Universiteit Leuven

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E. Vrancken

Katholieke Universiteit Leuven

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