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Dive into the research topics where Manabu Iwata is active.

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Featured researches published by Manabu Iwata.


Archive | 2005

Plasma processing device amd method

Akira Koshiishi; Masaru Sugimoto; Kunihiko Hinata; Noriyuki Kobayashi; Chishio Koshimizu; Ryuji Ohtani; Kazuo Kibi; Masashi Saito; Naoki Matsumoto; Yoshinobu Ooya; Manabu Iwata; Daisuke Yano; Yohei Yamazawa; Hidetoshi Hanaoka; Toshihiro Hayami; Hiroki Yamazaki; Manabu Sato


Archive | 2003

PLASMA PROCESSOR AND METHOD OF CALIBRATING MEANS FOR VARIABLE IMPEDANCE

Tsutomu Higashiura; Fumihiko Higuchi; Nobuhiro Iwama; Manabu Iwata; Chishio Koshimizu; Norikazu Murakami; Masako Nakatani; Akitaka Shimizu; Asao Yamashita; Yohei Yamazawa; Dongsheng Zhang; 中谷 理子; 山下 朝夫; 山澤 陽平; 岩田 学; 岩間 信浩; 張 東勝; 村上 範和; 東浦 勉; 樋口 文彦; 清水 昭貴; 輿水 地塩


Archive | 2009

PLASMA ETCHING APPARATUS AND METHOD, AND COMPUTER-READABLE STORAGE MEDIUM

Chishio Koshimizu; Manabu Iwata; Masanobu Honda; Hiroyuki Nakayama


Archive | 2009

PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD

Masanobu Honda; Kenji Masuzawa; Hiroyuki Nakayama; Manabu Iwata; Manabu Sato; Kazuki Narishige


Archive | 2008

Plasma processing apparatus and method of plasma distribution correction

Satoshi Tanaka; Chishio Koshimizu; Manabu Iwata; Naoki Matsumoto; Toru Ito


Archive | 2010

CHAMBER CLEANING METHOD

Masanobu Honda; Hidetoshi Hanaoka; Taichi Hirano; Takanori Mimura; Manabu Iwata; Taketoshi Okajo


Archive | 2009

ELECTRODE STRUCTURE AND SUBSTRATE PROCESSING APPARATUS

Hiroyuki Nakayama; Masanobu Honda; Kenji Masuzawa; Manabu Iwata


Archive | 2009

PLASMA PROCESSING APPARATUS AND METHOD, AND STORAGE MEDIUM

Manabu Iwata; Hiroyuki Nakayama; Kenji Masuzawa; Masanobu Honda


Archive | 2009

IN-CHAMBER MEMBER TEMPERATURE CONTROL METHOD, IN-CHAMBER MEMBER, SUBSTRATE MOUNTING TABLE AND PLASMA PROCESSING APPARATUS INCLUDING SAME

Chishio Koshimizu; Manabu Iwata; Tatsuo Matsudo


Archive | 2008

Method for controlling temperature of material in chamber of plasma treatment device, mounting stage for material in chamber and substrate, and plasma treatment device equipped with the same

Manabu Iwata; Chishio Koshimizu; Tatsuo Matsudo; 学 岩田; 龍夫 松土; 地塩 輿水

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Naoki Matsumoto

Sumitomo Electric Industries

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